Showing 145–160 of 233 results
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Price upon request
Niobium Disilicide (NbSi₂) Sputtering Target, 99.9% Purity, Circular (Price Upon Request) Nanostore’s Niobium Disilicide (NbSi₂) sputtering target is a 99.9% purity refractory metal silicide PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency,…
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£770.99 – £1,713.99Price range: £770.99 through £1,713.99
Niobium Nitride (NbN) Sputtering Target, 99.9% (3N) Purity, Circular Nanostore’s Niobium Nitride (NbN) sputtering target is a high-purity nitride ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency, and reliable material identity…
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£196.99 – £436.99Price range: £196.99 through £436.99
Niobium Pentoxide (Nb₂O₅) Sputtering Target, 99.99% Purity, Circular Nanostore’s Niobium Pentoxide (Nb₂O₅) sputtering target is a 99.99% purity oxide ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency, and reliable material identity…
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Price upon request
Niobium Tantalum Alloy (NbTa) Sputtering Target, 99.9% Purity, Nb:Ta = 1:1 at%, Circular (Price Upon Request) Nanostore’s Niobium Tantalum Alloy (NbTa) sputtering target is a 99.9% purity, nb:ta = 1:1 at% refractory metal alloy PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research,…
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Price upon request
Niobium Titanium Oxide (Nb₀.₁₃Ti₁.₈₇O₃) Sputtering Target, 99.99% Purity, Circular (Price Upon Request) Nanostore’s Niobium Titanium Oxide (Nb₀.₁₃Ti₁.₈₇O₃) sputtering target is a 99.99% purity mixed oxide ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling,…
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Price upon request
Palladium (Pd) Sputtering Target, 99.99% Purity, Circular (Price Upon Request) Nanostore’s Palladium (Pd) sputtering target is a 99.99% purity high-purity noble metal PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency, and reliable…
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Price upon request
Platinum (Pt) Sputtering Target, 99.99% Purity, Circular (Price Upon Request) Nanostore’s Platinum (Pt) sputtering target is a 99.99% purity high-purity noble metal PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency, and reliable…
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Price upon request
Polytetrafluoroethylene (PTFE) Sputtering Target, PTFE Polymer, Circular (Price Upon Request) Nanostore’s Polytetrafluoroethylene (PTFE) sputtering target is a ptfe polymer fluoropolymer PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency, and reliable material identity…
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Price upon request
Rhodium (Rh) Sputtering Target, 99.95% Purity, Circular Nanostore’s Rhodium (Rh) sputtering target is a 99.95% purity high-purity noble metal PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency, and reliable material identity are…
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Price upon request
Ruthenium (Ru) Sputtering Target, 99.95% Purity, Circular Nanostore’s Ruthenium (Ru) sputtering target is a 99.95% purity high-purity noble metal PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency, and reliable material identity are…
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Price upon request
Samarium Oxide (Sm₂O₃) Sputtering Target, 99.99% Purity, Circular (Price Upon Request) Nanostore’s Samarium Oxide (Sm₂O₃) sputtering target is a 99.99% purity rare-earth oxide ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency,…
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Price upon request
Scandium Oxide (Sc₂O₃) Sputtering Target, 99.99% Purity, Circular (Price Upon Request) Nanostore’s Scandium Oxide (Sc₂O₃) sputtering target is a 99.99% purity rare-earth oxide ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency,…
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£137.99 – £707.99Price range: £137.99 through £707.99
Silicon (Si) Sputtering Target, 99.999% Purity, Intrinsic / N-Type / P-Type, Circular (Price Upon Request) Nanostore’s Silicon (Si) sputtering target is a 99.999% purity, intrinsic / n-type / p-type semiconductor PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process…
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Price upon request
Silicon Carbide (SiC) Sputtering Target, 99.9% Purity, Circular (Price Upon Request) Nanostore’s Silicon Carbide (SiC) sputtering target is a 99.9% purity carbide ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency, and…
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£206.99 – £325.99Price range: £206.99 through £325.99
Silicon Dioxide (SiO₂) Sputtering Target, 99.99% Purity, Circular Nanostore’s Silicon Dioxide (SiO₂) sputtering target is a 99.99% purity oxide dielectric ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency, and reliable material…
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£368.99 – £908.99Price range: £368.99 through £908.99
Silicon Monoxide (SiO) Sputtering Target, 99.99% Purity, Circular Nanostore’s Silicon Monoxide (SiO) sputtering target is a 99.99% purity oxide ceramic evaporation and sputtering PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency, and…
