Showing 17–32 of 233 results
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£496.99 – £1,028.99Price range: £496.99 through £1,028.99
Bismuth Oxide (Bi₂O₃) Sputtering Target, 99.99% Purity, Circular Nanostore’s Bismuth Oxide (Bi₂O₃) sputtering target is a 99.99% purity oxide ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency, and reliable material identity…
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Price upon request
Bismuth Oxyselenide (Bi₂O₂Se) Sputtering Target, 99.9% Purity, Circular (Price Upon Request) Nanostore’s Bismuth Oxyselenide (Bi₂O₂Se) sputtering target is a 99.9% purity layered oxychalcogenide PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency, and…
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£736.99 – £1,045.99Price range: £736.99 through £1,045.99
Bismuth Selenide (Bi₂Se₃) Sputtering Target, 99.99% Purity, Circular Nanostore’s Bismuth Selenide (Bi₂Se₃) sputtering target is a 99.99% purity compound chalcogenide PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency, and reliable material identity…
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£873.99 – £1,130.99Price range: £873.99 through £1,130.99
Bismuth Sulfide (Bi₂S₃) Sputtering Target, 99.9% Purity, Circular Nanostore’s Bismuth Sulfide (Bi₂S₃) sputtering target is a 99.9% purity bismuth chalcogenide semiconductor PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency, and reliable material…
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£641.99 – £1,199.99Price range: £641.99 through £1,199.99
Bismuth Telluride (Bi₂Te₃) Sputtering Target, 99.99% Purity, Circular Nanostore’s Bismuth Telluride (Bi₂Te₃) sputtering target is a 99.99% purity compound chalcogenide PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency, and reliable material identity…
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£644.99 – £1,229.99Price range: £644.99 through £1,229.99
Boron (B) Sputtering Target, 99.9% Purity, Circular Nanostore’s Boron (B) sputtering target is a 99.9% purity high-purity nonmetal PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency, and reliable material identity are important….
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£410.99 – £761.99Price range: £410.99 through £761.99
Boron Carbide (B₄C) Sputtering Target, 99% Purity, Circular Nanostore’s Boron Carbide (B₄C) sputtering target is a 99% purity carbide ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency, and reliable material identity…
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£191.99 – £496.99Price range: £191.99 through £496.99
Boron Nitride (BN) Sputtering Target, 99.9% Purity, Circular Nanostore’s Boron Nitride (BN) sputtering target is a 99.9% purity nitride ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency, and reliable material identity…
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£577.99 – £1,096.99Price range: £577.99 through £1,096.99
Calcium Fluoride (CaF₂) Sputtering Target, 99.99% Purity, Circular Nanostore’s Calcium Fluoride (CaF₂) sputtering target is a 99.99% purity fluoride optical ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency, and reliable material…
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Price upon request
Cerium Oxide (CeO₂) Sputtering Target, 99.99% Purity, Circular (Price Upon Request) Nanostore’s Cerium Oxide (CeO₂) sputtering target is a 99.99% purity rare-earth oxide ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency,…
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£107.99 – £497.99Price range: £107.99 through £497.99
Chromium (Cr) Sputtering Target, 99.95%-99.99% Purity, Circular Nanostore’s Chromium (Cr) sputtering target is a 99.95%-99.99% purity transition-metal PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency, and reliable material identity are important. Key…
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Price upon request
Chromium Aluminum Tantalum Yttrium Alloy (CrAlTaY) Sputtering Target, 99.9% Purity, Cr:Al:Ta:Y = 60:20:17:3 at%, Circular (Price Upon Request) Nanostore’s Chromium Aluminum Tantalum Yttrium Alloy (CrAlTaY) sputtering target is a 99.9% purity, cr:al:ta:y = 60:20:17:3 at% multi-component high-temperature alloy PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular…
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Price upon request
Chromium Aluminum Tantalum Yttrium Alloy (CrAlTaY) Sputtering Target, 99.9% Purity, Cr:Al:Ta:Y = 67:22:8:3 at%, Circular (Price Upon Request) Nanostore’s Chromium Aluminum Tantalum Yttrium Alloy (CrAlTaY) sputtering target is a 99.9% purity, cr:al:ta:y = 67:22:8:3 at% multi-component high-temperature alloy PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular…
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Price upon request
Chromium Antimonide (CrSb) Sputtering Target, 99.99% Purity, Circular (Price Upon Request) Nanostore’s Chromium Antimonide (CrSb) sputtering target is a 99.99% purity antimonide compound PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency, and…
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Price upon request
Chromium Antimonide (CrSb) Sputtering Target, 99.99% Purity, Cr:Sb = 1:1.2 at%, Circular (Price Upon Request) Nanostore’s Chromium Antimonide (CrSb) sputtering target is a 99.99% purity, cr:sb = 1:1.2 at% antimonide compound PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch…
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£577.99 – £1,130.99Price range: £577.99 through £1,130.99
Chromium Carbide (Cr₃C₂) Sputtering Target, 99.5% Purity, Circular Nanostore’s Chromium Carbide (Cr₃C₂) sputtering target is a 99.5% purity transition-metal carbide ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency, and reliable material…
