Showing 97–112 of 233 results
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Price upon request
Iridium Manganese Alloy (IrMn) Sputtering Target, 99.9% Purity, Circular (Price Upon Request) Nanostore’s Iridium Manganese Alloy (IrMn) sputtering target is a 99.9% purity magnetic alloy PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional…
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£105.99 – £299.99Price range: £105.99 through £299.99
Iron (Fe) Sputtering Target, 99.95% Purity, Circular Nanostore’s Iron (Fe) sputtering target is a 99.95% purity ferromagnetic metallic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency, and reliable material identity are important….
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£874.99
Iron Chromium Aluminum Alloy (FeCrAl) Sputtering Target, 99.9% Purity, Circular Nanostore’s Iron Chromium Aluminum Alloy (FeCrAl) sputtering target is a 99.9% purity high-temperature resistance alloy PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional…
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Price upon request
Iron Gallium Alloy (FeGa) Sputtering Target, 99.99% Purity, Fe:Ga = 80:20 at%, Circular (Price Upon Request) Nanostore’s Iron Gallium Alloy (FeGa) sputtering target is a 99.99% purity, fe:ga = 80:20 at% magnetostrictive alloy PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development,…
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Price upon request
Iron Gallium Boron Alloy (FeGaB) Sputtering Target, Fe:Ga:B = 7:2:1 at%, Fe:Ga:B = 70.4:17.6:12 at%, Circular (Price Upon Request) Nanostore’s Iron Gallium Boron Alloy (FeGaB) sputtering target is a fe:ga:b = 7:2:1 at%, fe:ga:b = 70.4:17.6:12 at% magnetostrictive and magnetic alloy PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is…
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Price upon request
Iron Manganese Alloy (FeMn) Sputtering Target, 99.9% Purity, Fe:Mn = 50:50 at%, Circular (Price Upon Request) Nanostore’s Iron Manganese Alloy (FeMn) sputtering target is a 99.9% purity, fe:mn = 50:50 at% magnetic transition-metal alloy PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research,…
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£395.99 – £929.99Price range: £395.99 through £929.99
Iron(II,III) Oxide (Fe₃O₄) Sputtering Target, 99.9% Purity, Circular Nanostore’s Iron(II,III) Oxide (Fe₃O₄) sputtering target is a 99.9% purity magnetic oxide ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency, and reliable material…
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£515.99 – £904.99Price range: £515.99 through £904.99
Iron(III) Oxide (Fe₂O₃) Sputtering Target, 99.99% Purity, Circular Nanostore’s Iron(III) Oxide (Fe₂O₃) sputtering target is a 99.99% purity oxide ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency, and reliable material identity…
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£908.99 – £1,199.99Price range: £908.99 through £1,199.99
Lanthanum Aluminate (LaAlO₃) Sputtering Target, 99.9% Purity, Circular Nanostore’s Lanthanum Aluminate (LaAlO₃) sputtering target is a 99.9% purity perovskite aluminate oxide PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency, and reliable material…
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£556.99 – £873.99Price range: £556.99 through £873.99
Lanthanum Hexaboride (LaB₆) Sputtering Target, 99.9% Purity, Circular Nanostore’s Lanthanum Hexaboride (LaB₆) sputtering target is a 99.9% purity refractory boride ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency, and reliable material…
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Price upon request
Lanthanum Lithium Titanate (La₀.₅Li₀.₅TiO₃) Sputtering Target, 99.99% Purity, Circular (Price Upon Request) Nanostore’s Lanthanum Lithium Titanate (La₀.₅Li₀.₅TiO₃) sputtering target is a 99.99% purity lithium lanthanum titanate ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean…
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£206.99 – £316.99Price range: £206.99 through £316.99
Lead (Pb) Sputtering Target, 99.995%-99.999% Purity, Circular Nanostore’s Lead (Pb) sputtering target is a 99.995%-99.999% purity high-purity soft metal PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency, and reliable material identity are…
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Price upon request
Lead Telluride (PbTe) Sputtering Target, 99.999% (5N) Purity, Circular (Price Upon Request) Nanostore’s Lead Telluride (PbTe) sputtering target is a high-purity narrow-bandgap compound semiconductor PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency,…
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Price upon request
Lead Zirconate Titanate (PZT) Sputtering Target, 99.99% Purity, PbZr₀.₅₂Ti₀.₄₈O₃, Circular (Price Upon Request) Nanostore’s Lead Zirconate Titanate (PZT) sputtering target is a 99.99% purity, pbzr0.52ti0.48o3 piezoelectric ferroelectric ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where…
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£599.99 – £1,403.99Price range: £599.99 through £1,403.99
Lithium Cobalt Oxide (LiCoO₂) Sputtering Target, 99.9% Purity, Circular (Price Upon Request) Nanostore’s Lithium Cobalt Oxide (LiCoO₂) sputtering target is a 99.9% purity battery cathode oxide ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean…
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£650.99 – £959.99Price range: £650.99 through £959.99
Lithium Iron Phosphate (LiFePO₄) Sputtering Target, 99.9%-99.99% Purity, Circular Nanostore’s Lithium Iron Phosphate (LiFePO₄) sputtering target is a 99.9%-99.99% purity battery cathode phosphate ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency,…
