Showing 177–192 of 233 results
-
Price upon request
Tantalum Nitride (TaN) Sputtering Target, 99.9% Purity, Circular (Price Upon Request) Nanostore’s Tantalum Nitride (TaN) sputtering target is a 99.9% purity refractory nitride ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency,…
-
Price upon request
Tantalum Pentoxide (Ta₂O₅) Sputtering Target, 99.99% (4N) Purity, Circular (Price Upon Request) Nanostore’s Tantalum Pentoxide (Ta₂O₅) sputtering target is a high-purity oxide ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency, and…
-
£201.99 – £1,166.99Price range: £201.99 through £1,166.99
Tellurium (Te) Sputtering Target, 99.99% Purity, Circular Nanostore’s Tellurium (Te) sputtering target is a 99.99% purity high-purity metalloid material PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency, and reliable material identity are…
-
Price upon request
Thulium Iron Garnet (Tm₃Fe₅O₁₂) Sputtering Target, Stoichiometric Composition, Circular (Price Upon Request) Nanostore’s Thulium Iron Garnet (Tm₃Fe₅O₁₂) sputtering target is a stoichiometric composition rare-earth iron garnet ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean…
-
Price upon request
Thulium Oxide (Tm₂O₃) Sputtering Target, 99.99% Purity, Circular (Price Upon Request) Nanostore’s Thulium Oxide (Tm₂O₃) sputtering target is a 99.99% purity rare-earth oxide ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency,…
-
£89.99 – £509.99Price range: £89.99 through £509.99
Tin (Sn) Sputtering Target, 99.999% (5N) Purity, Circular (Price Upon Request) Nanostore’s Tin (Sn) sputtering target is a high-purity metallic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency, and reliable material identity…
-
£569.99 – £2,039.99Price range: £569.99 through £2,039.99
Tin Dioxide (SnO₂) Sputtering Target, 99.99% Purity, Circular (Price Upon Request) Nanostore’s Tin Dioxide (SnO₂) sputtering target is a 99.99% purity transparent conductive oxide ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional…
-
Price upon request
Tin Diselenide (SnSe₂) Sputtering Target, 99.99% Purity, Circular (Price Upon Request) Nanostore’s Tin Diselenide (SnSe₂) sputtering target is a 99.99% purity chalcogenide semiconductor ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency,…
-
Price upon request
Tin Disulfide (SnS₂) Sputtering Target, 99.99% Purity, Circular (Price Upon Request) Nanostore’s Tin Disulfide (SnS₂) sputtering target is a 99.99% purity chalcogenide semiconductor ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency,…
-
Price upon request
Tin Selenide (SnSe) Sputtering Target, 99.99% Purity, Circular (Price Upon Request) Nanostore’s Tin Selenide (SnSe) sputtering target is a 99.99% purity chalcogenide semiconductor ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency,…
-
Price upon request
Tin Sulfide (SnS) Sputtering Target, 99.99% Purity, Circular (Price Upon Request) Nanostore’s Tin Sulfide (SnS) sputtering target is a 99.99% purity chalcogenide semiconductor ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency,…
-
Price upon request
Tin Telluride (SnTe) Sputtering Target, 99.99% Purity, Circular (Price Upon Request) Nanostore’s Tin Telluride (SnTe) sputtering target is a 99.99% purity telluride semiconductor PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency, and…
-
£117.99 – £377.99Price range: £117.99 through £377.99
Titanium (Ti) Sputtering Target, 99.995% (4N5) Purity, Circular Nanostore’s Titanium (Ti) sputtering target is a high-purity metallic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency, and reliable material identity are important. Key…
-
Price upon request
Titanium Aluminum Alloy (TiAl) Sputtering Target, 99.9% Purity, Circular (Price Upon Request) Nanostore’s Titanium Aluminum Alloy (TiAl) sputtering target is a 99.9% purity lightweight high-temperature alloy PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling,…
-
Price upon request
Titanium Antimony Alloy (TiSb) Sputtering Target, 99.9% Purity, Ti:Sb = 2:3 at%, Circular (Price Upon Request) Nanostore’s Titanium Antimony Alloy (TiSb) sputtering target is a 99.9% purity, ti:sb = 2:3 at% custom binary alloy PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research,…
-
£395.99 – £933.99Price range: £395.99 through £933.99
Titanium Carbide (TiC) Sputtering Target, 99.9% Purity, Circular Nanostore’s Titanium Carbide (TiC) sputtering target is a 99.9% purity carbide ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency, and reliable material identity…
