Showing 193–208 of 233 results
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£281.99 – £488.99Price range: £281.99 through £488.99
Titanium Diboride (TiB₂) Sputtering Target, 99.9% Purity, Circular Nanostore’s Titanium Diboride (TiB₂) sputtering target is a 99.9% purity boride ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency, and reliable material identity…
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£196.99 – £401.99Price range: £196.99 through £401.99
Titanium Dioxide (TiO₂) Sputtering Target, 99.99% Purity, Circular Nanostore’s Titanium Dioxide (TiO₂) sputtering target is a 99.99% purity oxide ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency, and reliable material identity…
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£701.99 – £1,199.99Price range: £701.99 through £1,199.99
Titanium Disilicide (TiSi₂) Sputtering Target, 99.9% Purity, Circular Nanostore’s Titanium Disilicide (TiSi₂) sputtering target is a 99.9% purity metal silicide PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency, and reliable material identity…
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£701.99 – £1,173.99Price range: £701.99 through £1,173.99
Titanium Monoxide (TiO) Sputtering Target, 99.9% Purity, Circular Nanostore’s Titanium Monoxide (TiO) sputtering target is a 99.9% purity titanium monoxide ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency, and reliable material…
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£256.99 – £821.99Price range: £256.99 through £821.99
Titanium Nitride (TiN) Sputtering Target, 99.9% Purity, Circular Nanostore’s Titanium Nitride (TiN) sputtering target is a 99.9% purity nitride ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency, and reliable material identity…
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£577.99 – £1,045.99Price range: £577.99 through £1,045.99
Titanium Pentoxide (Ti₃O₅) Sputtering Target, 99.99% Purity, Circular Nanostore’s Titanium Pentoxide (Ti₃O₅) sputtering target is a 99.99% purity titanium oxide ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency, and reliable material…
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£788.99 – £873.99Price range: £788.99 through £873.99
Titanium Silicon Alloy (TiSi) Sputtering Target, 99.9% Purity, Ti:Si = 1:1 at%, Circular Nanostore’s Titanium Silicon Alloy (TiSi) sputtering target is a 99.9% purity, ti:si = 1:1 at% binary alloy and silicide research PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development,…
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Price upon request
Titanium Silicon Molybdenum Alloy (TiSiMo) Sputtering Target, 99.9% Purity, Ti:Si:Mo = 1:1:2 at%, Circular (Price Upon Request) Nanostore’s Titanium Silicon Molybdenum Alloy (TiSiMo) sputtering target is a 99.9% purity, ti:si:mo = 1:1:2 at% ternary alloy PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for…
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Price upon request
Titanium Silicon Tantalum Alloy (TiSiTa) Sputtering Target, 99.9% Purity, Ti:Si:Ta = 1:1:1 at%, Circular (Price Upon Request) Nanostore’s Titanium Silicon Tantalum Alloy (TiSiTa) sputtering target is a 99.9% purity, ti:si:ta = 1:1:1 at% ternary alloy PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for…
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£770.99 – £1,421.99Price range: £770.99 through £1,421.99
Titanium Telluride (TiTe₂) Sputtering Target, 99.9% Purity, Circular Nanostore’s Titanium Telluride (TiTe₂) sputtering target is a 99.9% purity transition-metal chalcogenide ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency, and reliable material…
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£488.99 – £1,118.99Price range: £488.99 through £1,118.99
Titanium(III) Oxide (Ti₂O₃) Sputtering Target, 99.9% Purity, Circular Nanostore’s Titanium(III) Oxide (Ti₂O₃) sputtering target is a 99.9% purity titanium oxide ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency, and reliable material…
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£104.99 – £1,481.99Price range: £104.99 through £1,481.99
Tungsten (W) Sputtering Target, 99.95%-99.999% Purity, Circular (Price Upon Request) Nanostore’s Tungsten (W) sputtering target is a 99.95%-99.999% purity high-purity refractory metal PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency, and reliable…
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Price upon request
Tungsten Carbide (WC) Sputtering Target, 99.9% Purity, Circular (Price Upon Request) Nanostore’s Tungsten Carbide (WC) sputtering target is a 99.9% purity carbide ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency, and…
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Price upon request
Tungsten Disilicide (WSi₂) Sputtering Target, 99.9% Purity, Circular (Price Upon Request) Nanostore’s Tungsten Disilicide (WSi₂) sputtering target is a 99.9% purity refractory metal silicide PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency,…
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£935.99 – £2,062.99Price range: £935.99 through £2,062.99
Tungsten Disulfide (WS₂) Sputtering Target, 99.9% Purity, Circular (Price Upon Request) Nanostore’s Tungsten Disulfide (WS₂) sputtering target is a 99.9% purity transition-metal dichalcogenide ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency,…
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Price upon request
Tungsten Ditelluride (WTe₂) Sputtering Target, 99.9% Purity, Circular (Price Upon Request) Nanostore’s Tungsten Ditelluride (WTe₂) sputtering target is a 99.9% purity transition-metal dichalcogenide PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency, and…
