Showing 81–96 of 233 results
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Price upon request
Hafnium Diboride (HfB₂) Sputtering Target, 99.5% Purity, Circular (Price Upon Request) Nanostore’s Hafnium Diboride (HfB₂) sputtering target is a 99.5% purity ultra-high-temperature boride ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency,…
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Price upon request
Hafnium Dioxide (HfO₂) Sputtering Target, 99.99% Purity, Circular (Price Upon Request) Nanostore’s Hafnium Dioxide (HfO₂) sputtering target is a 99.99% purity high-k oxide ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency,…
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Price upon request
Hafnium Nitride (HfN) Sputtering Target, 99.5% Purity, Circular (Price Upon Request) Nanostore’s Hafnium Nitride (HfN) sputtering target is a 99.5% purity nitride ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency, and…
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Price upon request
Hafnium Zirconium Oxide (HfO₂-ZrO₂) Sputtering Target, 99.99% Purity, HfO₂:ZrO₂ = 50:50 mol%, Circular (Price Upon Request) Nanostore’s Hafnium Zirconium Oxide (HfO₂-ZrO₂) sputtering target is a 99.99% purity, hfo2:zro2 = 50:50 mol% mixed high-k oxide ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for…
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Price upon request
Hydroxyapatite (Ca₁₀(PO₄)₆(OH)₂) Sputtering Target, 99.9% Purity, Circular (Price Upon Request) Nanostore’s Hydroxyapatite (Ca₁₀(PO₄)₆(OH)₂) sputtering target is a 99.9% purity calcium phosphate ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency, and reliable…
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Price upon request
Indium (In) Sputtering Target, 99.995% Purity, Circular (Price Upon Request) Nanostore’s Indium (In) sputtering target is a 99.995% purity soft post-transition metal PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency, and reliable…
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Price upon request
Indium Antimonide (InSb) Sputtering Target, 99.99% Purity, Circular (Price Upon Request) Nanostore’s Indium Antimonide (InSb) sputtering target is a 99.99% purity III-V compound semiconductor PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency,…
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Price upon request
Indium Gallium Selenide (InGaSe) Sputtering Target, 99.99% Purity, Custom Composition, Circular (Price Upon Request) Nanostore’s Indium Gallium Selenide (InGaSe) sputtering target is a 99.99% purity, custom composition custom indium gallium chalcogenide PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch…
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Price upon request
Indium Gallium Zinc Oxide (IGZO) Sputtering Target, 99.99% Purity, In₂O₃:Ga₂O₃:ZnO = 1:1:1 mol%, Circular (Price Upon Request) Nanostore’s Indium Gallium Zinc Oxide (IGZO) sputtering target is a 99.99% purity, in2o3:ga2o3:zno = 1:1:1 mol% transparent oxide semiconductor ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target…
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Price upon request
Indium Gallium Zinc Oxide (IGZO) Sputtering Target, 99.99% Purity, In₂O₃:Ga₂O₃:ZnO = 1:1:2 mol%, Circular (Price Upon Request) Nanostore’s Indium Gallium Zinc Oxide (IGZO) sputtering target is a 99.99% purity, in2o3:ga2o3:zno = 1:1:2 mol% transparent oxide semiconductor PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats…
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Price upon request
Indium Oxide (In₂O₃) Sputtering Target, 99.99% Purity, Circular (Price Upon Request) Nanostore’s Indium Oxide (In₂O₃) sputtering target is a 99.99% purity transparent conductive oxide ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional…
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Price upon request
Indium Selenide (In₂Se₃) Sputtering Target, 99.99% Purity, Circular (Price Upon Request) Nanostore’s Indium Selenide (In₂Se₃) sputtering target is a 99.99% purity chalcogenide semiconductor ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency,…
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Price upon request
Indium Sulfide (In₂S₃) Sputtering Target, 99.99% Purity, Circular (Price Upon Request) Nanostore’s Indium Sulfide (In₂S₃) sputtering target is a 99.99% purity chalcogenide semiconductor ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency,…
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Price upon request
Indium Tin Oxide (ITO) Sputtering Target, 99.99% Purity, In₂O₃:SnO₂ = 90:10 wt%, Circular (Price Upon Request) Nanostore’s Indium Tin Oxide (ITO) sputtering target is a 99.99% purity, in2o3:sno2 = 90:10 wt% transparent conductive oxide ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for…
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Price upon request
Indium Tungsten Oxide (IWO) Sputtering Target, 99.99% Purity, Circular (Price Upon Request) Nanostore’s Indium Tungsten Oxide (IWO) sputtering target is a 99.99% purity transparent conductive oxide ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean…
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Price upon request
Iridium (Ir) Sputtering Target, 99.95% Purity, Circular Nanostore’s Iridium (Ir) sputtering target is a 99.95% purity high-purity noble metal PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency, and reliable material identity are…
