Showing 465–480 of 1232 results

  • Hafnium (Hf) Wire, 99.95% Purity

    Hafnium (Hf) Wire, 99.95% Purity (Request Current Price)

    Price upon request

    Hafnium (Hf) Wire, 99.95% Purity (Request Current Price) Nanostore Hafnium (Hf) wire is a high-purity thin-film and materials-research source format supplied for PVD source loading, evaporation-related workflows, filament or wire studies, alloy preparation, and laboratory materials development. The wire and rod formats support precise cutting, weighing, fixture loading, and small-batch experimental work where material identity,…

  • Hafnium Carbide (HfC) Sputtering Target, 99.5% Purity, Circular (Price Upon Request)

    Hafnium Carbide (HfC) Sputtering Target, 99.5% Purity, Circular (Price Upon Request)

    Price upon request

    Hafnium Carbide (HfC) Sputtering Target, 99.5% Purity, Circular (Price Upon Request) Nanostore’s Hafnium Carbide (HfC) sputtering target is a 99.5% purity ultra-high-temperature carbide ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency,…

  • Hafnium Diboride (HfB2) Sputtering Target, 99.5% Purity, Circular (Price Upon Request)

    Hafnium Diboride (HfB₂) Sputtering Target, 99.5% Purity, Circular (Price Upon Request)

    Price upon request

    Hafnium Diboride (HfB₂) Sputtering Target, 99.5% Purity, Circular (Price Upon Request) Nanostore’s Hafnium Diboride (HfB₂) sputtering target is a 99.5% purity ultra-high-temperature boride ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency,…

  • Hafnium Dioxide (HfO2) Sputtering Target, 99.99% Purity, Circular (Price Upon Request)

    Hafnium Dioxide (HfO₂) Sputtering Target, 99.99% Purity, Circular (Price Upon Request)

    Price upon request

    Hafnium Dioxide (HfO₂) Sputtering Target, 99.99% Purity, Circular (Price Upon Request) Nanostore’s Hafnium Dioxide (HfO₂) sputtering target is a 99.99% purity high-k oxide ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency,…

  • Hafnium Nitride (HfN) Sputtering Target, 99.5% Purity, Circular (Price Upon Request)

    Hafnium Nitride (HfN) Sputtering Target, 99.5% Purity, Circular (Price Upon Request)

    Price upon request

    Hafnium Nitride (HfN) Sputtering Target, 99.5% Purity, Circular (Price Upon Request) Nanostore’s Hafnium Nitride (HfN) sputtering target is a 99.5% purity nitride ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency, and…

  • Hafnium Oxide (HfO2) Evaporation Pellets, 99.99% Purity

    Hafnium Oxide (HfO₂) Evaporation Pellets, 99.99% Purity (Request Current Price)

    Price upon request

    Hafnium Oxide (HfO₂) Evaporation Pellets, 99.99% Purity (Request Current Price) Nanostore Hafnium Oxide (HfO₂) evaporation pellets are high-purity compound source materials supplied for evaporation coating, thin-film deposition research, optical and functional films, and laboratory PVD process development. The pellet format is convenient for weighing, source loading, and small-batch experimental workflows where clean handling and controlled…

  • Hafnium Zirconium Oxide (HfO2-ZrO2) Sputtering Target, 99.99% Purity, HfO2:ZrO2 = 50:50 mol%, Circular (Price Upon Request)

    Hafnium Zirconium Oxide (HfO₂-ZrO₂) Sputtering Target, 99.99% Purity, HfO₂:ZrO₂ = 50:50 mol%, Circular (Price Upon Request)

    Price upon request

    Hafnium Zirconium Oxide (HfO₂-ZrO₂) Sputtering Target, 99.99% Purity, HfO₂:ZrO₂ = 50:50 mol%, Circular (Price Upon Request) Nanostore’s Hafnium Zirconium Oxide (HfO₂-ZrO₂) sputtering target is a 99.99% purity, hfo2:zro2 = 50:50 mol% mixed high-k oxide ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for…

  • Hard Carbon Anode Sheet (Double-Sided)

    Hard Carbon Anode Sheet (Double-Sided)

    £167.99

    Product: Hard Carbon Anode Sheet (Double-Sided Coated Aluminum Foil) Application: Anode Material for Sodium-ion Batteries Product Overview: This product features a double-sided Hard Carbon coating on an aluminum current collector. It is specifically designed as an anode material for sodium-ion battery research. Key Specifications (Double-Sided Reference): Sheet Dimensions: 241 mm L x 200 mm W…

  • Hard Carbon Anode Sheet (Single-Sided)

    Hard Carbon Anode Sheet (Single-Sided)

    £167.99

    Product: Hard Carbon Anode Sheet (Single-Sided Coated Aluminum Foil) Application: Anode Material for Sodium-ion Batteries Product Overview: This product features a single-sided Hard Carbon coating on an aluminum current collector. It is specifically designed as an anode material for sodium-ion battery research. Key Specifications (Single-Sided Reference): Sheet Dimensions: 241 mm L x 200 mm W…

  • HCP020 Carbon Paper (Fuel Cell GDL Material)

    HCP020 Carbon Paper (Fuel Cell GDL Material)

    £83.99

    HCP020 Carbon Paper (Fuel Cell GDL Material) Application: Gas Diffusion Layer (GDL) for Fuel Cells and Electrolyzers Product Overview: This carbon paper is a high-performance Gas Diffusion Layer material, available in distinct hydrophilic (N) and hydrophobic (P) surface treatments to optimize water and gas transport within electrochemical cells. Specifications by Model: – HCP020N (Hydrophilic) –…

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  • HCP331 Carbon Cloth (Fuel Cell GDL Material)

    HCP331 Carbon Cloth (Fuel Cell GDL Material)

    £125.99

    HCP331 Carbon Cloth (Fuel Cell GDL Material) Application: Gas Diffusion Layer (GDL) for Fuel Cells and Electrolyzers Product Overview: This rigid grade carbon cloth is a high-performance Gas Diffusion Layer material, available in two variants: hydrophilic (N) for enhanced wetting and hydrophobic (P) for improved water management. Key Specifications (Common): Dimensions (L x W): 32…

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  • Hexagonal Boron Nitride (h-BN) Grown on Copper Foil (10 cm x 10 cm)

    Hexagonal Boron Nitride (h-BN) Grown on Copper Foil (10 cm x 10 cm)

    £899.99

    Hexagonal Boron Nitride (h-BN) Grown on Copper Foil (10 cm x 10 cm) CAS Number: 10043-11-5 Preparation Method: Hexagonal boron nitride (h-BN) films are grown on copper foils using a Chemical Vapor Deposition (CVD) process, resulting in high-quality and uniform layers. Morphology Options: Monolayer Few Layers (<10 layers, ~5 nm) Multilayer (>5 nm) All options…

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  • Hexagonal Boron Nitride (h-BN) Grown on Copper Foil (5 cm x 10 cm)

    Hexagonal Boron Nitride (h-BN) Grown on Copper Foil (5 cm x 10 cm)

    £699.99

    Hexagonal Boron Nitride (h-BN) Grown on Copper Foil (5 cm x 10 cm) CAS Number: 10043-11-5 Preparation Method: Hexagonal boron nitride (h-BN) films are grown on copper foils using a Chemical Vapor Deposition (CVD) process, resulting in high-quality and uniform layers. Morphology Options: Monolayer Few Layers (<10 layers, ~5 nm) Multilayer (>5 nm) All options…

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  • Hexagonal Boron Nitride (h-BN) Grown on Copper Foil (5 cm x 5 cm)

    Hexagonal Boron Nitride (h-BN) Grown on Copper Foil (5 cm x 5 cm)

    £499.99

    Hexagonal Boron Nitride (h-BN) Grown on Copper Foil (5 cm x 5 cm) CAS Number: 10043-11-5 Preparation Method: Hexagonal boron nitride (h-BN) films are grown on copper foils using a Chemical Vapor Deposition (CVD) process, resulting in high-quality and uniform layers. Morphology Options: Monolayer Few Layers (<10 layers, ~5 nm) Multilayer (>5 nm) All options…

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  • Hexagonal Boron Nitride (h-BN) Transferred onto PET Substrate (1 cm x 1 cm)

    Hexagonal Boron Nitride (h-BN) Transferred onto PET Substrate (1 cm x 1 cm)

    £219.99

    Hexagonal Boron Nitride (h-BN) Transferred onto PET Substrate (1 cm x 1 cm) CAS Number: 10043-11-5 Preparation Method: Hexagonal boron nitride (h-BN) films are first grown on copper foils using a high-temperature Chemical Vapor Deposition (CVD) process. These high-quality h-BN films are then carefully transferred onto flexible PET (polyethylene terephthalate) substrates using a PMMA-assisted wet…

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  • Hexagonal Boron Nitride (h-BN) Transferred onto Quartz Substrate (1 cm x 1 cm)

    Hexagonal Boron Nitride (h-BN) Transferred onto Quartz Substrate (1 cm x 1 cm)

    £219.99

    Hexagonal Boron Nitride (h-BN) Transferred onto Quartz Substrate (1 cm x 1 cm) CAS Number: 10043-11-5 Preparation Method: Hexagonal boron nitride (h-BN) films are initially grown on copper foils using a high-temperature Chemical Vapor Deposition (CVD) process. These high-quality h-BN films are then transferred onto quartz substrates using a PMMA-assisted wet chemical transfer technique to…

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