Hexagonal Boron Nitride (h-BN) Grown on Copper Foil (5 cm x 5 cm)

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    Hexagonal Boron Nitride (h-BN) Grown on Copper Foil (5 cm x 5 cm)

    CAS Number: 10043-11-5

    Preparation Method: Hexagonal boron nitride (h-BN) films are grown on copper foils using a Chemical Vapor Deposition (CVD) process, resulting in high-quality and uniform layers. Morphology Options:
    Monolayer
    Few Layers (<10 layers, ~5 nm) Multilayer (>5 nm)
    All options are available at the same price. For specific requirements, please contact us directly.

    Substrate Options:
    h-BN films are directly grown on copper foils, making them suitable for further transfer or direct applications. Custom transfer to other substrate materials is available upon request-please visit our Custom Products page or contact us for assistance.

    Fundamental Properties:
    Hexagonal boron nitride (h-BN) is a layered two-dimensional material with excellent chemical, thermal, and mechanical stability. It is an electrical insulator with a wide bandgap (~5.9 eV), making it ideal for applications requiring dielectric properties. Key properties include:
    Chemical Stability: High resistance to oxidation and chemical degradation.
    Thermal Stability: Can withstand high temperatures, making it suitable for extreme environments.
    Mechanical Strength: Exceptional strength and flexibility, enabling robust device integration.
    Wide Bandgap: Excellent dielectric properties for use as an insulating layer.

    Applications:
    Electronics: Ideal as a dielectric layer or substrate for graphene and other 2D materials in advanced electronic devices.
    Optoelectronics: Used in light-emitting devices and UV detectors.
    Thermal Management: Suitable for high-performance thermal insulation and heat dissipation.
    Sensors: Serves as a chemically stable insulating material for gas and chemical sensors. Energy Applications: Utilized as a protective or insulating layer in energy storage and conversion devices.

    Option 1

    Few Layers (<10 layers, ~5 nm), Monolayer, Multilayer (>5 nm)