Silicon Monoxide (SiO) Evaporation Pellets, 99.95% Purity

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    Silicon Monoxide (SiO) Evaporation Pellets, 99.95% Purity

    Nanostore Silicon Monoxide (SiO) evaporation pellets are high-purity compound source materials supplied for evaporation coating, thin-film deposition research, optical and functional films, and laboratory PVD process development. The pellet format is convenient for weighing, source loading, and small-batch experimental workflows where clean handling and controlled material identity are important.

    Key Features

    High-Purity Compound Evaporation Material
    Available purity options include 99.95% (3N5) for research workflows that require controlled compound composition.

    Pellet Format for Source Loading
    Available particle-size options include 0.118 in-0.394 in (3-10 mm) pieces. Package options include 1 kg, 100 g, 500 g depending on selected purity and configuration.

    Compound Material Selection
    This material is a silicon oxide evaporation material supplied as evaporation pellets for thin-film deposition and coating research.

    Technical Specifications

    Material: Silicon Monoxide (SiO)
    Form: Evaporation Pellets
    Purity Options: 99.95% (3N5)
    Available Size Options: 0.118 in-0.394 in (3-10 mm) pieces
    Package Options: 1 kg, 100 g, 500 g
    Category: Evaporation Materials
    Typical Use: Evaporation source material, PVD research, optical coating, and laboratory materials science

    Material Handling and Quality Notes

    – Quality control: source information notes chemical analysis methods such as ICP/GDMS and screening for particle size and appearance consistency.
    – Packaging and storage: keep sealed, dry, and protected from contamination; handle with clean gloves or tools before loading.

    Quality-Control and Handling Indicators

    Additional technical indicators reflected from the source product page:

    – Analytical checks: ICP-MS trace-element analysis; ICP impurity/composition analysis; GDMS trace-metal analysis; carbon/sulfur impurity analysis; nitrogen/oxygen impurity analysis.
    – Inspection focus: surface cleanliness measurement; micrometer dimensional inspection; appearance inspection; dimensional verification.
    – Handling and storage: sealed dry storage and protective packaging; clean-glove handling to avoid oil, dust, moisture, and surface contamination; careful handling to prevent compression, impact, or chipping.
    – Deposition-use context: magnetron sputtering systems; ion sputtering systems; micro/nano fabrication research; semiconductor thin-film development; photovoltaic materials research; flat-panel display coating research.

    Common Applications

    – silicon monoxide evaporation source loading
    – optical coating and barrier film research
    – SiOx thin-film and protective coating studies
    – laboratory silicon oxide deposition process development
    – Academic, industrial, and pilot-scale thin-film materials research

    Option 1

    99.95% (3N5)

    Option 2

    0.118 in-0.394 in (3-10 mm) pieces

    Option 3

    1 kg, 100 g, 500 g