Showing 1041–1056 of 1232 results
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£58.99 – £262.99Price range: £58.99 through £262.99
Thermal SiO₂ on N-Type (Phosphorus-Doped) Si (100) Wafers Overview Our thermal silicon dioxide (SiO₂) wafers are fabricated using high-temperature thermal oxidation on N-type (phosphorus-doped) Si (100) substrates with a resistivity range of 1–10 Ω·cm. Thermally grown oxide provides superior film density, excellent thickness uniformity, low interface trap density, and high dielectric strength compared to deposited…
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£58.99 – £262.99Price range: £58.99 through £262.99
Thermal SiO₂ on P-Type (Boron-Doped) Si (100) Wafers Overview Our thermal silicon dioxide (SiO₂) wafers are fabricated using high-temperature thermal oxidation on P-type (boron-doped) Si (100) substrates. Available resistivity ranges include 1–10 Ω·cm and heavily doped 0.001–0.005 Ω·cm options. Thermally grown SiO₂ provides superior film density, excellent dielectric strength, and a stable Si/SiO₂ interface compared…
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£58.99 – £250.99Price range: £58.99 through £250.99
Thermal SiO₂ on Undoped Si (100) Wafers Overview Our thermal silicon dioxide (SiO₂) wafers are fabricated using high-temperature dry/wet thermal oxidation on undoped Si (100) substrates. Thermal oxide provides superior film density, excellent uniformity, low defect density, and outstanding electrical insulation compared to deposited oxide films. These wafers are widely used in semiconductor research, MOS…
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£227.99
Thermosensitive High-Surface-Area Double-Sided Carbon-Coated Aluminum Foil for Dry-Process Electrodes This material is designed as a current collector for dry-process electrodes. It consists of an aluminum foil substrate coated on both sides with a thermosensitive, high-surface-area carbon layer. The coating provides improved conductivity, optimized interfacial contact, and enhanced electrode stability under dry-process fabrication conditions. Specifications Substrate…
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£251.99
Thermosensitive High-Surface-Area Double-Sided Carbon-Coated Copper Foil for Dry-Process Electrodes This material is a copper-foil current collector engineered for dry-process electrode fabrication. The foil features a thermosensitive, high-surface-area carbon coating applied to both sides, providing improved interfacial contact and enhanced coating adhesion suitable for dry electrode processing. Customized widths and single-/double-sided coating configurations are available upon…
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£1,300.00
Thin-film optical spectrum electrochemical cell with electrode, in 0.5mm or 1mm slit widths for spectroelectrochemistry.
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£66.00 – £428.00Price range: £66.00 through £428.00
Borosilicate glass and PTFE three-electrode cell, sealed or unsealed, for routine voltammetry from room temperature to 60°C.
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Price upon request
Thulium Iron Garnet (Tm₃Fe₅O₁₂) Sputtering Target, Stoichiometric Composition, Circular (Price Upon Request) Nanostore’s Thulium Iron Garnet (Tm₃Fe₅O₁₂) sputtering target is a stoichiometric composition rare-earth iron garnet ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean…
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Price upon request
Thulium Oxide (Tm₂O₃) Evaporation Pellets, 99.95% Purity (Request Current Price) Nanostore Thulium Oxide (Tm₂O₃) evaporation pellets are high-purity compound source materials supplied for evaporation coating, thin-film deposition research, optical and functional films, and laboratory PVD process development. The pellet format is convenient for weighing, source loading, and small-batch experimental workflows where clean handling and controlled…
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Price upon request
Thulium Oxide (Tm₂O₃) Sputtering Target, 99.99% Purity, Circular (Price Upon Request) Nanostore’s Thulium Oxide (Tm₂O₃) sputtering target is a 99.99% purity rare-earth oxide ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency,…
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Price upon request
Tin (Sn) Pellets And Pieces, 99.99%-99.9999% Purity (Request Current Price) Nanostore Tin (Sn) pellets and pieces are high-purity source materials supplied for thin-film deposition research, evaporation source loading, alloy preparation, and laboratory materials development. The pellet and piece formats are convenient for weighing, loading, and small-batch experimental workflows where material identity, purity selection, and clean…
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£89.99 – £509.99Price range: £89.99 through £509.99
Tin (Sn) Sputtering Target, 99.999% (5N) Purity, Circular (Price Upon Request) Nanostore’s Tin (Sn) sputtering target is a high-purity metallic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency, and reliable material identity…
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Price upon request
Tin (Sn) Wire, 99.99% Purity (Request Current Price) Nanostore Tin (Sn) wire is a high-purity thin-film and materials-research source format supplied for PVD source loading, evaporation-related workflows, filament or wire studies, alloy preparation, and laboratory materials development. The wire and rod formats support precise cutting, weighing, fixture loading, and small-batch experimental work where material identity,…
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£569.99 – £2,039.99Price range: £569.99 through £2,039.99
Tin Dioxide (SnO₂) Sputtering Target, 99.99% Purity, Circular (Price Upon Request) Nanostore’s Tin Dioxide (SnO₂) sputtering target is a 99.99% purity transparent conductive oxide ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional…
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£429.99
Tin Diselenide (SnSe₂) CAS Number: 20770-09-6 Substrate Size: 1 cm x 1 cm Preparation Method: Chemical Vapor Deposition (CVD) Substrate Options: SnSe₂ films are directly grown on sapphire substrates. Custom transfer to other substrates is available upon request-please visit our Custom Products page or contact us for assistance. Fundamental Properties: Tin diselenide (SnSe₂) is a…
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Price upon request
Tin Diselenide (SnSe₂) Sputtering Target, 99.99% Purity, Circular (Price Upon Request) Nanostore’s Tin Diselenide (SnSe₂) sputtering target is a 99.99% purity chalcogenide semiconductor ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency,…
