Showing 17–32 of 233 results
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د.إ2,531.42 – د.إ5,241.16Price range: د.إ2,531.42 through د.إ5,241.16
Bismuth Oxide (Bi₂O₃) Sputtering Target, 99.99% Purity, Circular Nanostore’s Bismuth Oxide (Bi₂O₃) sputtering target is a 99.99% purity oxide ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work. Key Features Source Material Supplied as 99.99% Purity for…
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Price upon request
Bismuth Oxyselenide (Bi₂O₂Se) Sputtering Target, 99.9% Purity, Circular (Price Upon Request) Nanostore’s Bismuth Oxyselenide (Bi₂O₂Se) sputtering target is a 99.9% purity layered oxychalcogenide PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work. Pricing is provided upon request because…
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د.إ3,753.86 – د.إ5,327.75Price range: د.إ3,753.86 through د.إ5,327.75
Bismuth Selenide (Bi₂Se₃) Sputtering Target, 99.99% Purity, Circular Nanostore’s Bismuth Selenide (Bi₂Se₃) sputtering target is a 99.99% purity compound chalcogenide PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work. Key Features Source Material Supplied as 99.99% Purity for…
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د.إ4,451.67 – د.إ5,760.70Price range: د.إ4,451.67 through د.إ5,760.70
Bismuth Sulfide (Bi₂S₃) Sputtering Target, 99.9% Purity, Circular Nanostore’s Bismuth Sulfide (Bi₂S₃) sputtering target is a 99.9% purity bismuth chalcogenide semiconductor PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work. Key Features Source Material Supplied as 99.9% Purity…
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د.إ3,269.98 – د.إ6,112.15Price range: د.إ3,269.98 through د.إ6,112.15
Bismuth Telluride (Bi₂Te₃) Sputtering Target, 99.99% Purity, Circular Nanostore’s Bismuth Telluride (Bi₂Te₃) sputtering target is a 99.99% purity compound chalcogenide PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work. Key Features Source Material Supplied as 99.99% Purity for…
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د.إ3,285.26 – د.إ6,264.96Price range: د.إ3,285.26 through د.إ6,264.96
Boron (B) Sputtering Target, 99.9% Purity, Circular Nanostore’s Boron (B) sputtering target is a 99.9% purity nonmetal PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency, and consistent material identity are important. Key…
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د.إ2,093.38 – د.إ3,881.20Price range: د.إ2,093.38 through د.إ3,881.20
Boron Carbide (B₄C) Sputtering Target, 99% Purity, Circular Nanostore’s Boron Carbide (B₄C) sputtering target is a 99% purity carbide ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work. Key Features Source Material Supplied as 99% Purity for…
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د.إ977.90 – د.إ2,531.42Price range: د.إ977.90 through د.إ2,531.42
Boron Nitride (BN) Sputtering Target, 99.9% Purity, Circular Nanostore’s Boron Nitride (BN) sputtering target is a 99.9% purity nitride ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency, and consistent material identity…
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د.إ2,943.99 – د.إ5,587.52Price range: د.إ2,943.99 through د.إ5,587.52
Calcium Fluoride (CaF₂) Sputtering Target, 99.99% Purity, Circular Nanostore’s Calcium Fluoride (CaF₂) sputtering target is a 99.99% purity fluoride optical ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work. Key Features Source Material Supplied as 99.99% Purity…
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Price upon request
Cerium Oxide (CeO₂) Sputtering Target, 99.99% Purity, Circular (Price Upon Request) Nanostore’s Cerium Oxide (CeO₂) sputtering target is a 99.99% purity rare-earth oxide ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work. Pricing is provided upon request…
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د.إ550.05 – د.إ2,536.51Price range: د.إ550.05 through د.إ2,536.51
Chromium (Cr) Sputtering Target, 99.95%-99.99% Purity, Circular Nanostore’s Chromium (Cr) sputtering target is a 99.95%-99.99% purity transition-metal PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency, and consistent material identity are important. Key…
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Price upon request
Chromium Aluminum Tantalum Yttrium Alloy (CrAlTaY) Sputtering Target, 99.9% Purity, Cr:Al:Ta:Y = 60:20:17:3 at%, Circular (Price Upon Request) ZHC LAB’s Chromium Aluminum Tantalum Yttrium Alloy (CrAlTaY) sputtering target is a 99.9% purity, cr:al:ta:y = 60:20:17:3 at% multi-component high-temperature alloy PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in…
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Price upon request
Chromium Aluminum Tantalum Yttrium Alloy (CrAlTaY) Sputtering Target, 99.9% Purity, Cr:Al:Ta:Y = 67:22:8:3 at%, Circular (Price Upon Request) ZHC LAB’s Chromium Aluminum Tantalum Yttrium Alloy (CrAlTaY) sputtering target is a 99.9% purity, cr:al:ta:y = 67:22:8:3 at% multi-component high-temperature alloy PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in…
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Price upon request
Chromium Antimonide (CrSb) Sputtering Target, 99.99% Purity, Circular (Price Upon Request) ZHC LAB’s Chromium Antimonide (CrSb) sputtering target is a 99.99% purity antimonide compound PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency,…
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Price upon request
Chromium Antimonide (CrSb) Sputtering Target, 99.99% Purity, Cr:Sb = 1:1.2 at%, Circular (Price Upon Request) ZHC LAB’s Chromium Antimonide (CrSb) sputtering target is a 99.99% purity, cr:sb = 1:1.2 at% antimonide compound PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and…
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د.إ2,943.99 – د.إ5,760.70Price range: د.إ2,943.99 through د.إ5,760.70
Chromium Carbide (Cr₃C₂) Sputtering Target, 99.5% Purity, Circular Nanostore’s Chromium Carbide (Cr₃C₂) sputtering target is a 99.5% purity transition-metal carbide ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work. Key Features Source Material Supplied as 99.5% Purity…
