Showing 33–48 of 233 results
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د.إ3,575.59 – د.إ5,714.86Price range: د.إ3,575.59 through د.إ5,714.86
Chromium Diboride (CrB₂) Sputtering Target, 99.5% Purity, Circular Nanostore’s Chromium Diboride (CrB₂) sputtering target is a 99.5% purity transition-metal boride ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency, and consistent material…
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د.إ2,490.67 – د.إ5,327.75Price range: د.إ2,490.67 through د.إ5,327.75
Chromium Disilicide (CrSi₂) Sputtering Target, 99.9% Purity, Circular Nanostore’s Chromium Disilicide (CrSi₂) sputtering target is a 99.9% purity transition-metal silicide PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency, and consistent material identity…
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د.إ3,101.89 – د.إ6,198.74Price range: د.إ3,101.89 through د.إ6,198.74
Chromium Nitride (CrN) Sputtering Target, 99.5% Purity, Circular ZHC LAB’s Chromium Nitride (CrN) sputtering target is a 99.5% purity transition-metal nitride ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency, and specified…
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Price upon request
Chromium Vanadium Alloy (CrV) Sputtering Target, 99.9% Purity, Cr:V = 1:1 at%, Circular (Price Upon Request) ZHC LAB’s Chromium Vanadium Alloy (CrV) sputtering target is a 99.9% purity, cr:v = 1:1 at% binary transition-metal alloy PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for…
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د.إ2,103.57
Chromium(III) Oxide (Cr₂O₃) Sputtering Target, 99.99% Purity, Circular Nanostore’s Chromium(III) Oxide (Cr₂O₃) sputtering target is a 99.99% purity transition-metal oxide ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency, and consistent material…
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د.إ580.61 – د.إ1,670.62Price range: د.إ580.61 through د.إ1,670.62
Cobalt (Co) Sputtering Target, 99.95% (3N5) Purity, Circular (Price Upon Request) Cobalt (Co) sputtering target is a magnetic metallic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, stated dimensions, and material identity are specified….
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Price upon request
Cobalt Iron Boron Alloy (CoFeB) Sputtering Target, 99.9% Purity, Co:Fe:B = 40:40:20 at%, Circular (Price Upon Request) ZHC LAB’s Cobalt Iron Boron Alloy (CoFeB) sputtering target is a 99.9% purity, co:fe:b = 40:40:20 at% magnetic alloy PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats…
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Price upon request
Cobalt Oxide (CoO) Sputtering Target, 99.9% Purity, Circular (Price Upon Request) Nanostore’s Cobalt Oxide (CoO) sputtering target is a 99.9% purity transition-metal oxide ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work. Pricing is provided upon request…
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Price upon request
Cobalt(II,III) Oxide (Co₃O₄) Sputtering Target, 99.9% Purity, Circular (Price Upon Request) Nanostore’s Cobalt(II,III) Oxide (Co₃O₄) sputtering target is a 99.9% purity transition-metal oxide ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work. Pricing is provided upon request…
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Price upon request
Cobalt(III) Oxide (Co₂O₃) Sputtering Target, 99.9% Purity, Circular (Price Upon Request) Nanostore’s Cobalt(III) Oxide (Co₂O₃) sputtering target is a 99.9% purity transition-metal oxide ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work. Pricing is provided upon request…
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د.إ539.86 – د.إ728.32Price range: د.إ539.86 through د.إ728.32
Copper (Cu) Sputtering Target, 99.99% (4N) Purity, Circular Nanostore’s Copper (Cu) Sputtering Target is a high-purity circular disc manufactured for magnetron sputtering deposition of copper thin films. The target is produced from 99.99% (4N) purity copper feedstock through controlled large-deformation processing to achieve a fine, uniform grain structure that promotes consistent sputter erosion rates, low…
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د.إ422.71 – د.إ906.59Price range: د.إ422.71 through د.إ906.59 Original price was: د.إ422.71 – د.إ906.59Price range: د.إ422.71 through د.إ906.59.د.إ381.96 – د.إ814.91Price range: د.إ381.96 through د.إ814.91Current price is: د.إ381.96 – د.إ814.91Price range: د.إ381.96 through د.إ814.91. Hot
Copper (Cu) Sputtering Target, 99.995% Purity, Circular (Price Upon Request) Nanostore’s Copper (Cu) sputtering target is a 99.995% purity conductive metallic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work. Pricing for this material is provided upon request…
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د.إ763.97 – د.إ2,475.39Price range: د.إ763.97 through د.إ2,475.39
Copper (Cu) Sputtering Target, 99.9995%-99.9999% Purity, Circular (Price Upon Request) Nanostore’s Copper (Cu) sputtering target is a 99.9995%-99.9999% purity conductive metallic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency, and consistent material…
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Price upon request
Copper Gallium Selenide (CuGaSe) Sputtering Target, 99.99% Purity, Custom Composition, Circular (Price Upon Request) Nanostore’s Copper Gallium Selenide (CuGaSe) sputtering target is a 99.99% purity, custom composition custom copper chalcogenide PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process…
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Price upon request
Copper Indium Gallium Selenide (CIGS) Sputtering Target, 99.99% Purity, Cu:In:Ga:Se = 1:0.7:0.3:2 at%, Circular (Price Upon Request) ZHC LAB’s Copper Indium Gallium Selenide (CIGS) sputtering target is a 99.99% purity, cu:in:ga:se = 1:0.7:0.3:2 at% compound semiconductor chalcogenide PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target…
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Price upon request
Copper Indium Gallium Selenide (CIGS) Sputtering Target, 99.99% Purity, Custom Composition, Circular (Price Upon Request) Nanostore’s Copper Indium Gallium Selenide (CIGS) sputtering target is a 99.99% purity, custom composition custom quaternary chalcogenide PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and…
