Showing 17–32 of 233 results
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$691.92 – $1,432.58Price range: $691.92 through $1,432.58
Bismuth Oxide (Bi₂O₃) Sputtering Target, 99.99% Purity, Circular Nanostore’s Bismuth Oxide (Bi₂O₃) sputtering target is a 99.99% purity oxide ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work. Key Features Source Material Supplied as 99.99% Purity for…
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Price upon request
Bismuth Oxyselenide (Bi₂O₂Se) Sputtering Target, 99.9% Purity, Circular (Price Upon Request) Nanostore’s Bismuth Oxyselenide (Bi₂O₂Se) sputtering target is a 99.9% purity layered oxychalcogenide PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work. Pricing is provided upon request because…
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$1,026.05 – $1,456.24Price range: $1,026.05 through $1,456.24
Bismuth Selenide (Bi₂Se₃) Sputtering Target, 99.99% Purity, Circular Nanostore’s Bismuth Selenide (Bi₂Se₃) sputtering target is a 99.99% purity compound chalcogenide PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work. Key Features Source Material Supplied as 99.99% Purity for…
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$1,216.78 – $1,574.58Price range: $1,216.78 through $1,574.58
Bismuth Sulfide (Bi₂S₃) Sputtering Target, 99.9% Purity, Circular Nanostore’s Bismuth Sulfide (Bi₂S₃) sputtering target is a 99.9% purity bismuth chalcogenide semiconductor PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work. Key Features Source Material Supplied as 99.9% Purity…
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$893.79 – $1,670.64Price range: $893.79 through $1,670.64
Bismuth Telluride (Bi₂Te₃) Sputtering Target, 99.99% Purity, Circular Nanostore’s Bismuth Telluride (Bi₂Te₃) sputtering target is a 99.99% purity compound chalcogenide PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work. Key Features Source Material Supplied as 99.99% Purity for…
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$897.97 – $1,712.41Price range: $897.97 through $1,712.41
Boron (B) Sputtering Target, 99.9% Purity, Circular Nanostore’s Boron (B) sputtering target is a 99.9% purity nonmetal PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency, and consistent material identity are important. Key…
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$572.19 – $1,060.85Price range: $572.19 through $1,060.85
Boron Carbide (B₄C) Sputtering Target, 99% Purity, Circular Nanostore’s Boron Carbide (B₄C) sputtering target is a 99% purity carbide ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work. Key Features Source Material Supplied as 99% Purity for…
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$267.29 – $691.92Price range: $267.29 through $691.92
Boron Nitride (BN) Sputtering Target, 99.9% Purity, Circular Nanostore’s Boron Nitride (BN) sputtering target is a 99.9% purity nitride ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency, and consistent material identity…
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$804.69 – $1,527.25Price range: $804.69 through $1,527.25
Calcium Fluoride (CaF₂) Sputtering Target, 99.99% Purity, Circular Nanostore’s Calcium Fluoride (CaF₂) sputtering target is a 99.99% purity fluoride optical ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work. Key Features Source Material Supplied as 99.99% Purity…
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Price upon request
Cerium Oxide (CeO₂) Sputtering Target, 99.99% Purity, Circular (Price Upon Request) Nanostore’s Cerium Oxide (CeO₂) sputtering target is a 99.99% purity rare-earth oxide ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work. Pricing is provided upon request…
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$150.35 – $693.31Price range: $150.35 through $693.31
Chromium (Cr) Sputtering Target, 99.95%-99.99% Purity, Circular Nanostore’s Chromium (Cr) sputtering target is a 99.95%-99.99% purity transition-metal PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency, and consistent material identity are important. Key…
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Price upon request
Chromium Aluminum Tantalum Yttrium Alloy (CrAlTaY) Sputtering Target, 99.9% Purity, Cr:Al:Ta:Y = 60:20:17:3 at%, Circular (Price Upon Request) ZHC LAB’s Chromium Aluminum Tantalum Yttrium Alloy (CrAlTaY) sputtering target is a 99.9% purity, cr:al:ta:y = 60:20:17:3 at% multi-component high-temperature alloy PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in…
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Price upon request
Chromium Aluminum Tantalum Yttrium Alloy (CrAlTaY) Sputtering Target, 99.9% Purity, Cr:Al:Ta:Y = 67:22:8:3 at%, Circular (Price Upon Request) ZHC LAB’s Chromium Aluminum Tantalum Yttrium Alloy (CrAlTaY) sputtering target is a 99.9% purity, cr:al:ta:y = 67:22:8:3 at% multi-component high-temperature alloy PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in…
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Price upon request
Chromium Antimonide (CrSb) Sputtering Target, 99.99% Purity, Circular (Price Upon Request) ZHC LAB’s Chromium Antimonide (CrSb) sputtering target is a 99.99% purity antimonide compound PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency,…
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Price upon request
Chromium Antimonide (CrSb) Sputtering Target, 99.99% Purity, Cr:Sb = 1:1.2 at%, Circular (Price Upon Request) ZHC LAB’s Chromium Antimonide (CrSb) sputtering target is a 99.99% purity, cr:sb = 1:1.2 at% antimonide compound PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and…
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$804.69 – $1,574.58Price range: $804.69 through $1,574.58
Chromium Carbide (Cr₃C₂) Sputtering Target, 99.5% Purity, Circular Nanostore’s Chromium Carbide (Cr₃C₂) sputtering target is a 99.5% purity transition-metal carbide ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work. Key Features Source Material Supplied as 99.5% Purity…
