Showing 17–32 of 233 results
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ر.س2,584.84 – ر.س5,351.77Price range: ر.س2,584.84 through ر.س5,351.77
Bismuth Oxide (Bi₂O₃) Sputtering Target, 99.99% Purity, Circular Nanostore’s Bismuth Oxide (Bi₂O₃) sputtering target is a 99.99% purity oxide ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work. Key Features Source Material Supplied as 99.99% Purity for…
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Price upon request
Bismuth Oxyselenide (Bi₂O₂Se) Sputtering Target, 99.9% Purity, Circular (Price Upon Request) Nanostore’s Bismuth Oxyselenide (Bi₂O₂Se) sputtering target is a 99.9% purity layered oxychalcogenide PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work. Pricing is provided upon request because…
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ر.س3,833.08 – ر.س5,440.18Price range: ر.س3,833.08 through ر.س5,440.18
Bismuth Selenide (Bi₂Se₃) Sputtering Target, 99.99% Purity, Circular Nanostore’s Bismuth Selenide (Bi₂Se₃) sputtering target is a 99.99% purity compound chalcogenide PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work. Key Features Source Material Supplied as 99.99% Purity for…
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ر.س4,545.61 – ر.س5,882.27Price range: ر.س4,545.61 through ر.س5,882.27
Bismuth Sulfide (Bi₂S₃) Sputtering Target, 99.9% Purity, Circular Nanostore’s Bismuth Sulfide (Bi₂S₃) sputtering target is a 99.9% purity bismuth chalcogenide semiconductor PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work. Key Features Source Material Supplied as 99.9% Purity…
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ر.س3,338.98 – ر.س6,241.14Price range: ر.س3,338.98 through ر.س6,241.14
Bismuth Telluride (Bi₂Te₃) Sputtering Target, 99.99% Purity, Circular Nanostore’s Bismuth Telluride (Bi₂Te₃) sputtering target is a 99.99% purity compound chalcogenide PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work. Key Features Source Material Supplied as 99.99% Purity for…
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ر.س3,354.59 – ر.س6,397.16Price range: ر.س3,354.59 through ر.س6,397.16
Boron (B) Sputtering Target, 99.9% Purity, Circular Nanostore’s Boron (B) sputtering target is a 99.9% purity nonmetal PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency, and consistent material identity are important. Key…
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ر.س2,137.55 – ر.س3,963.10Price range: ر.س2,137.55 through ر.س3,963.10
Boron Carbide (B₄C) Sputtering Target, 99% Purity, Circular Nanostore’s Boron Carbide (B₄C) sputtering target is a 99% purity carbide ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work. Key Features Source Material Supplied as 99% Purity for…
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ر.س998.54 – ر.س2,584.84Price range: ر.س998.54 through ر.س2,584.84
Boron Nitride (BN) Sputtering Target, 99.9% Purity, Circular Nanostore’s Boron Nitride (BN) sputtering target is a 99.9% purity nitride ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency, and consistent material identity…
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ر.س3,006.12 – ر.س5,705.43Price range: ر.س3,006.12 through ر.س5,705.43
Calcium Fluoride (CaF₂) Sputtering Target, 99.99% Purity, Circular Nanostore’s Calcium Fluoride (CaF₂) sputtering target is a 99.99% purity fluoride optical ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work. Key Features Source Material Supplied as 99.99% Purity…
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Price upon request
Cerium Oxide (CeO₂) Sputtering Target, 99.99% Purity, Circular (Price Upon Request) Nanostore’s Cerium Oxide (CeO₂) sputtering target is a 99.99% purity rare-earth oxide ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work. Pricing is provided upon request…
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ر.س561.65 – ر.س2,590.04Price range: ر.س561.65 through ر.س2,590.04
Chromium (Cr) Sputtering Target, 99.95%-99.99% Purity, Circular Nanostore’s Chromium (Cr) sputtering target is a 99.95%-99.99% purity transition-metal PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency, and consistent material identity are important. Key…
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Price upon request
Chromium Aluminum Tantalum Yttrium Alloy (CrAlTaY) Sputtering Target, 99.9% Purity, Cr:Al:Ta:Y = 60:20:17:3 at%, Circular (Price Upon Request) ZHC LAB’s Chromium Aluminum Tantalum Yttrium Alloy (CrAlTaY) sputtering target is a 99.9% purity, cr:al:ta:y = 60:20:17:3 at% multi-component high-temperature alloy PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in…
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Price upon request
Chromium Aluminum Tantalum Yttrium Alloy (CrAlTaY) Sputtering Target, 99.9% Purity, Cr:Al:Ta:Y = 67:22:8:3 at%, Circular (Price Upon Request) ZHC LAB’s Chromium Aluminum Tantalum Yttrium Alloy (CrAlTaY) sputtering target is a 99.9% purity, cr:al:ta:y = 67:22:8:3 at% multi-component high-temperature alloy PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in…
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Price upon request
Chromium Antimonide (CrSb) Sputtering Target, 99.99% Purity, Circular (Price Upon Request) ZHC LAB’s Chromium Antimonide (CrSb) sputtering target is a 99.99% purity antimonide compound PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency,…
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Price upon request
Chromium Antimonide (CrSb) Sputtering Target, 99.99% Purity, Cr:Sb = 1:1.2 at%, Circular (Price Upon Request) ZHC LAB’s Chromium Antimonide (CrSb) sputtering target is a 99.99% purity, cr:sb = 1:1.2 at% antimonide compound PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and…
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ر.س3,006.12 – ر.س5,882.27Price range: ر.س3,006.12 through ر.س5,882.27
Chromium Carbide (Cr₃C₂) Sputtering Target, 99.5% Purity, Circular Nanostore’s Chromium Carbide (Cr₃C₂) sputtering target is a 99.5% purity transition-metal carbide ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work. Key Features Source Material Supplied as 99.5% Purity…
