WSe₂ FET Device

WSe₂ FET Device

Device Specifications:

Packaging: Single device (1 unit per package)
Device Dimensions: 1 cm x 1 cm
Substrate: SiO₂/Si (Silicon with 300 nm SiO₂ layer)

Device Structure:
SiO₂/Si Substrate / WSe₂ Channel / Au or Cr+Au Electrodes

Device Description & Features:
WSe₂ layered 2D Semiconductor: Tungsten diselenide (WSe₂) is a layered transition metal dichalcogenide (TMD) with a layer-dependent bandgap (monolayer: direct bandgap ~1.6 eV, multilayer: indirect bandgap), supporting electronics and optoelectronics. Back-Gated FET Configuration: The SiO₂/Si substrate serves as a global back-gate, providing electrostatic control over the WSe₂ channel. Stable p-Type or Ambipolar Conductivity: WSe₂ can function as a p-type or ambipolar transistor, depending on doping, contact engineering, and gate voltage tuning. Mechanically Exfoliated or CVD-Grown WSe₂: For electronic-property studies.
Ohmic Contact Engineering: Au or Cr+Au electrodes provide low-resistance metal contacts, supporting charge injection.

Applications:
Field-Effect Transistors (FETs):
Tunable electronic properties support low-power electronics. Flexible and Transparent Electronics:
For wearable electronics, transparent circuits, and flexible transistors. Optoelectronic & Photodetector

Applications:
light-matter interaction can support use in photodetectors, LEDs, and photovoltaic devices. Spintronics & Quantum Transport:
spin-orbit coupling in WSe₂ allows for applications in spintronic and quantum computing devices.