Black Phosphorus/ReSe₂ FET Device
Heterojunction FET Device
Device Structure:
Conductive Si Substrate / 300 nm SiO₂ Layer / 5 µm Gold Electrode Array / ReSe₂ / Black Phosphorus
Device Description & Features:
2D van der Waals Heterojunction: The combination of anisotropic black phosphorus (BP) and ReSe₂ forms a type-II band-aligned heterostructure, enabling charge separation and carrier transport. Layer-Dependent Bandgap Engineering:
Black Phosphorus (BP): A layer-tunable direct bandgap (~0.3 eV for bulk, ~1.5 eV for monolayer) offering high mobility and anisotropy.
ReSe₂: A low-symmetry TMD with an anisotropic band structure (~1.3 eV direct bandgap in monolayer form), allowing transport properties. Back-Gated FET Configuration: The SiO₂/Si back-gate structure is used for electrostatic-control studies. Gold Electrode Array (5 µm spacing): For carrier-injection and 2D-transport studies.
Applications:
Field-Effect Transistors (FETs):
The heterostructure channel supports tunable electronic properties, used for nanoelectronics. Anisotropic Charge Transport & Directional Electronics:
The layered anisotropic nature of BP and ReSe₂ allows studies on directional carrier transport. Optoelectronic & Photodetector
Applications:
The type-II band alignment supports photogenerated carrier separation, and it is used for photodetectors and photovoltaics. Neuromorphic & Quantum Computing:
band structure and interlayer coupling effects support neuromorphic logic and quantum electronic applications.
| Option 1 | Few-layer (~5 layers), Multilayer (~10 layers) |
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