Showing 177–192 of 233 results
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Price upon request
Tantalum Nitride (TaN) Sputtering Target, 99.9% Purity, Circular (Price Upon Request) ZHC LAB’s Tantalum Nitride (TaN) sputtering target is a 99.9% purity refractory nitride ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional…
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Price upon request
Tantalum Pentoxide (Ta₂O₅) Sputtering Target, 99.99% (4N) Purity, Circular (Price Upon Request) Nanostore’s Tantalum Pentoxide (Ta₂O₅) sputtering target is a oxide ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, stated dimensions, and material…
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$281.21 – $1,624.70Price range: $281.21 through $1,624.70
Tellurium (Te) Sputtering Target, 99.99% Purity, Circular Nanostore’s Tellurium (Te) sputtering target is a 99.99% purity metalloid material PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency, and consistent material identity are important….
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Price upon request
Thulium Iron Garnet (Tm₃Fe₅O₁₂) Sputtering Target, Stoichiometric Composition, Circular (Price Upon Request) Nanostore’s Thulium Iron Garnet (Tm₃Fe₅O₁₂) sputtering target is a stoichiometric composition rare-earth iron garnet ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work. Pricing is…
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Price upon request
Thulium Oxide (Tm₂O₃) Sputtering Target, 99.99% Purity, Circular (Price Upon Request) Nanostore’s Thulium Oxide (Tm₂O₃) sputtering target is a 99.99% purity rare-earth oxide ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work. Pricing is provided upon request…
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$125.29 – $710.02Price range: $125.29 through $710.02
Tin (Sn) Sputtering Target, 99.999% (5N) Purity, Circular (Price Upon Request) Tin (Sn) sputtering target is a metallic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, stated dimensions, and material identity are specified. Pricing…
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$793.55 – $2,840.11Price range: $793.55 through $2,840.11
Tin Dioxide (SnO₂) Sputtering Target, 99.99% Purity, Circular (Price Upon Request) Nanostore’s Tin Dioxide (SnO₂) sputtering target is a 99.99% purity transparent conductive oxide ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work. Pricing is provided upon…
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Price upon request
Tin Diselenide (SnSe₂) Sputtering Target, 99.99% Purity, Circular (Price Upon Request) Nanostore’s Tin Diselenide (SnSe₂) sputtering target is a 99.99% purity chalcogenide semiconductor ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work. Pricing is provided upon request…
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Price upon request
Tin Disulfide (SnS₂) Sputtering Target, 99.99% Purity, Circular (Price Upon Request) Nanostore’s Tin Disulfide (SnS₂) sputtering target is a 99.99% purity chalcogenide semiconductor ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work. Pricing is provided upon request…
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Price upon request
Tin Selenide (SnSe) Sputtering Target, 99.99% Purity, Circular (Price Upon Request) ZHC LAB’s Tin Selenide (SnSe) sputtering target is a 99.99% purity chalcogenide semiconductor ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional…
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Price upon request
Tin Sulfide (SnS) Sputtering Target, 99.99% Purity, Circular (Price Upon Request) ZHC LAB’s Tin Sulfide (SnS) sputtering target is a 99.99% purity chalcogenide semiconductor ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional…
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Price upon request
Tin Telluride (SnTe) Sputtering Target, 99.99% Purity, Circular (Price Upon Request) ZHC LAB’s Tin Telluride (SnTe) sputtering target is a 99.99% purity telluride semiconductor PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency,…
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$164.27 – $526.24Price range: $164.27 through $526.24
Titanium (Ti) Sputtering Target, 99.995% (4N5) Purity, Circular Nanostore’s Titanium (Ti) sputtering target is a metallic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, stated dimensions, and material identity are specified. Key Features Source…
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Price upon request
Titanium Aluminum Alloy (TiAl) Sputtering Target, 99.9% Purity, Circular (Price Upon Request) Nanostore’s Titanium Aluminum Alloy (TiAl) sputtering target is a 99.9% purity lightweight high-temperature alloy PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling,…
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Price upon request
Titanium Antimony Alloy (TiSb) Sputtering Target, 99.9% Purity, Ti:Sb = 2:3 at%, Circular (Price Upon Request) ZHC LAB’s Titanium Antimony Alloy (TiSb) sputtering target is a 99.9% purity, ti:sb = 2:3 at% custom binary alloy PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for…
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$551.30 – $1,300.32Price range: $551.30 through $1,300.32
Titanium Carbide (TiC) Sputtering Target, 99.9% Purity, Circular ZHC LAB’s Titanium Carbide (TiC) sputtering target is a 99.9% purity carbide ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency, and specified material…
