Showing 209–224 of 233 results
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Price upon request
Tungsten Rhenium Alloy (W-Re) Sputtering Target, 99.99% Purity, Circular (Price Upon Request) Nanostore’s Tungsten Rhenium Alloy (W-Re) sputtering target is a 99.99% purity high-temperature refractory alloy PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling,…
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Price upon request
Tungsten Titanium Alloy (WTi) Sputtering Target, 99.99% Purity, W:Ti = 90:10 wt%, Circular (Price Upon Request) Nanostore’s Tungsten Titanium Alloy (WTi) sputtering target is a 99.99% purity, w:ti = 90:10 wt% refractory metal alloy PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research,…
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Price upon request
Tungsten Trioxide (WO₃) Sputtering Target, 99.99% Purity, Circular (Price Upon Request) Nanostore’s Tungsten Trioxide (WO₃) sputtering target is a 99.99% purity transition-metal oxide ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work. Pricing is provided upon request…
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Price upon request
Tungsten Trioxide (WO₃) Sputtering Target, 99.99% Purity, Oxygen-Deficient Dark Gray Grade, Circular (Price Upon Request) Nanostore’s Tungsten Trioxide (WO₃) sputtering target is a 99.99% purity, oxygen-deficient dark gray grade oxygen-deficient tungsten oxide PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and…
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$215.78 – $1,058.07Price range: $215.78 through $1,058.07
Vanadium (V) Sputtering Target, 99.9% Purity, Circular (Price Upon Request) Nanostore’s Vanadium (V) sputtering target is a 99.9% purity transition metal PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency, and consistent material…
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Price upon request
Vanadium Carbide (VC) Sputtering Target, 99.9% Purity, Circular (Price Upon Request) ZHC LAB’s Vanadium Carbide (VC) sputtering target is a 99.9% purity transition-metal carbide ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional…
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Price upon request
Vanadium Diboride (VB₂) Sputtering Target, 99.5% Purity, Circular (Price Upon Request) Nanostore’s Vanadium Diboride (VB₂) sputtering target is a 99.5% purity transition-metal boride ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency,…
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Price upon request
Vanadium Dioxide (VO₂) Sputtering Target, 99.9% Purity, Circular (Price Upon Request) Nanostore’s Vanadium Dioxide (VO₂) sputtering target is a 99.9% purity transition-metal oxide ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work. Pricing is provided upon request…
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Price upon request
Vanadium Disilicide (VSi₂) Sputtering Target, 99.9% Purity, Circular (Price Upon Request) Nanostore’s Vanadium Disilicide (VSi₂) sputtering target is a 99.9% purity transition-metal silicide PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency, and…
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Price upon request
Vanadium Nitride (VN) Sputtering Target, 99.5% Purity, Circular (Price Upon Request) ZHC LAB’s Vanadium Nitride (VN) sputtering target is a 99.5% purity transition-metal nitride ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional…
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Price upon request
Ytterbium Oxide (Yb₂O₃) Sputtering Target, 99.99% Purity, Circular (Price Upon Request) Nanostore’s Ytterbium Oxide (Yb₂O₃) sputtering target is a 99.99% purity rare-earth oxide ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work. Pricing is provided upon request…
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Price upon request
Yttria-Stabilized Zirconia (ZrO₂:Y₂O₃) Sputtering Target, 99.9% Purity, ZrO₂:Y₂O₃ = 92:8 at%, Circular (Price Upon Request) Nanostore’s Yttria-Stabilized Zirconia (ZrO₂:Y₂O₃) sputtering target is a 99.9% purity, zro2:y2o3 = 92:8 at% yttria-doped zirconia ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and…
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$893.79 – $1,574.58Price range: $893.79 through $1,574.58
Yttrium Fluoride (YF₃) Sputtering Target, 99.99% Purity, Circular Nanostore’s Yttrium Fluoride (YF₃) sputtering target is a 99.99% purity rare-earth fluoride optical PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work. Key Features Source Material Supplied as 99.99% Purity…
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$858.98
Yttrium Iron Garnet (Y₃Fe₅O₁₂) Sputtering Target, 99.99% Purity, Circular Nanostore’s Yttrium Iron Garnet (Y₃Fe₅O₁₂) sputtering target is a 99.99% purity magnetic oxide ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work. Some configurations require a formal quote…
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$537.38 – $1,169.45Price range: $537.38 through $1,169.45
Yttrium Oxide (Y₂O₃) Sputtering Target, 99.99% Purity, Circular Nanostore’s Yttrium Oxide (Y₂O₃) sputtering target is a 99.99% purity rare-earth oxide ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work. Key Features Source Material Supplied as 99.99% Purity…
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$164.27 – $484.48Price range: $164.27 through $484.48
Zinc (Zn) Sputtering Target, 99.995% Purity, Circular Nanostore’s Zinc (Zn) sputtering target is a 99.995% purity metallic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency, and consistent material identity are important. Key…
