Showing 145–160 of 233 results
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Price upon request
Niobium Disilicide (NbSi₂) Sputtering Target, 99.9% Purity, Circular (Price Upon Request) Nanostore’s Niobium Disilicide (NbSi₂) sputtering target is a 99.9% purity refractory metal silicide PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency,…
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$1,073.38 – $2,386.24Price range: $1,073.38 through $2,386.24
Niobium Nitride (NbN) Sputtering Target, 99.9% (3N) Purity, Circular Niobium Nitride (NbN) sputtering target is a nitride ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where controlled handling, stated dimensions, and material identity are specified. Features…
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$274.25 – $608.38Price range: $274.25 through $608.38
Niobium Pentoxide (Nb₂O₅) Sputtering Target, 99.99% Purity, Circular Nanostore’s Niobium Pentoxide (Nb₂O₅) sputtering target is a 99.99% purity oxide ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work. Key Features Source Material Supplied as 99.99% Purity for…
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Price upon request
Niobium Tantalum Alloy (NbTa) Sputtering Target, 99.9% Purity, Nb:Ta = 1:1 at%, Circular (Price Upon Request) ZHC LAB’s Niobium Tantalum Alloy (NbTa) sputtering target is a 99.9% purity, nb:ta = 1:1 at% refractory metal alloy PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for…
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Price upon request
Niobium Titanium Oxide (Nb₀.₁₃Ti₁.₈₇O₃) Sputtering Target, 99.99% Purity, Circular (Price Upon Request) Nanostore’s Niobium Titanium Oxide (Nb₀.₁₃Ti₁.₈₇O₃) sputtering target is a 99.99% purity mixed oxide ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work. Pricing is provided…
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Price upon request
Palladium (Pd) Sputtering Target, 99.99% Purity, Circular (Price Upon Request) Nanostore’s Palladium (Pd) sputtering target is a 99.99% purity noble metal PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency, and consistent material…
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Price upon request
Platinum (Pt) Sputtering Target, 99.99% Purity, Circular (Price Upon Request) Nanostore’s Platinum (Pt) sputtering target is a 99.99% purity noble metal PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency, and consistent material…
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Price upon request
Polytetrafluoroethylene (PTFE) Sputtering Target, PTFE Polymer, Circular (Price Upon Request) Nanostore’s Polytetrafluoroethylene (PTFE) sputtering target is a ptfe polymer fluoropolymer PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency, and consistent material identity…
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Price upon request
Rhodium (Rh) Sputtering Target, 99.95% Purity, Circular Nanostore’s Rhodium (Rh) sputtering target is a 99.95% purity noble metal PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency, and consistent material identity are important….
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Price upon request
Ruthenium (Ru) Sputtering Target, 99.95% Purity, Circular Nanostore’s Ruthenium (Ru) sputtering target is a 99.95% purity noble metal PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency, and consistent material identity are important….
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Price upon request
Samarium Oxide (Sm₂O₃) Sputtering Target, 99.99% Purity, Circular (Price Upon Request) Nanostore’s Samarium Oxide (Sm₂O₃) sputtering target is a 99.99% purity rare-earth oxide ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work. Pricing is provided upon request…
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Price upon request
Scandium Oxide (Sc₂O₃) Sputtering Target, 99.99% Purity, Circular (Price Upon Request) Nanostore’s Scandium Oxide (Sc₂O₃) sputtering target is a 99.99% purity rare-earth oxide ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work. Pricing is provided upon request…
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$192.11 – $985.67Price range: $192.11 through $985.67
Silicon (Si) Sputtering Target, 99.999% Purity, Intrinsic / N-Type / P-Type, Circular (Price Upon Request) Nanostore’s Silicon (Si) sputtering target is a 99.999% purity, intrinsic / n-type / p-type semiconductor PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process…
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Price upon request
Silicon Carbide (SiC) Sputtering Target, 99.9% Purity, Circular (Price Upon Request) Nanostore’s Silicon Carbide (SiC) sputtering target is a 99.9% purity carbide ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency, and…
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$288.17 – $453.85Price range: $288.17 through $453.85
Silicon Dioxide (SiO₂) Sputtering Target, 99.99% Purity, Circular Nanostore’s Silicon Dioxide (SiO₂) sputtering target is a 99.99% purity oxide dielectric ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work. Key Features Source Material Supplied as 99.99% Purity…
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$513.71 – $1,265.51Price range: $513.71 through $1,265.51
Silicon Monoxide (SiO) Sputtering Target, 99.99% Purity, Circular ZHC LAB’s Silicon Monoxide (SiO) sputtering target is a 99.99% purity oxide ceramic evaporation and sputtering PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency,…
