SiO₂ Single Crystal Substrate
물리적 특성:
– 결정 구조: Hexagonal System
– 격자 상수: a=4.914 Angstrom, c=5.405 Angstrom
– 밀도: 2.65 g/cm³
– 융점: 1700 °C(상전이 온도 573.1°C)
– 경도: 7 (Mohs)
– 성장 방법: 수열법
표준 사양:
1. 방위 / 컷
– Z-cut (001), X-cut (110), Y-cut (100): 미스컷 < 0.3°
– ST-cut, AT-cut: 제공 가능
2. 에지 방위
– 제공 가능
3. 표면 품질
– 표면 조도: Ra < 0.5 nm (CMP)
– 연마: Single-side polished / Double-side polished
| 옵션 1 | 10 × 10 × 0.5 mm, X-cut (110), Double-Side Polished, 10 × 10 × 0.5 mm, X-cut (110), Single-Side Polished, 10 × 10 × 0.5 mm, Y-cut (100), Double-Side Polished, 10 × 10 × 0.5 mm, Y-cut (100), Single-Side Polished, 10 × 10 × 0.5 mm, Z-cut (001), Double-Side Polished, 10 × 10 × 0.5 mm, Z-cut (001), Single-Side Polished, 5 × 5 × 0.5 mm, X-cut (110), Double-Side Polished, 5 × 5 × 0.5 mm, X-cut (110), Single-Side Polished, 5 × 5 × 0.5 mm, Y-cut (100), Double-Side Polished, 5 × 5 × 0.5 mm, Y-cut (100), Single-Side Polished, 5 × 5 × 0.5 mm, Z-cut (001), Double-Side Polished, 5 × 5 × 0.5 mm, Z-cut (001), Single-Side Polished |
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