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Showing 1121–1136 of 1232 results
Tungsten Diselenide (WSe₂) on 4-Inch Sapphire Wafer CAS Number: 12067-46-8 Substrate Size: 4-Inch Sapphire Wafer Preparation Method: Chemical Vapor Deposition (CVD) Substrate Options: WSe₂ films are directly grown on sapphire substrates. Custom transfer to other substrates is available upon request-please visit the Custom Products page or contact us for assistance. Fundamental Properties: Tungsten diselenide (WSe₂)…
Tungsten Disilicide (WSi₂) Sputtering Target, 99.9% Purity, Circular (Price Upon Request) Nanostore’s Tungsten Disilicide (WSi₂) sputtering target is a 99.9% purity refractory metal silicide PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work. Pricing is provided upon request…
Tungsten Disulfide (WS₂) CAS Number: 12138-09-9 Substrate Size: 1 cm x 1 cm Preparation Method: Chemical Vapor Deposition (CVD) Substrate Options: WS₂ films are grown directly on sapphire substrates. Custom transfer to other substrates is available upon request-please visit the Custom Products page or contact us for assistance. Fundamental Properties: Tungsten disulfide (WS₂) is a…
Tungsten Disulfide (WS₂) Film on 2-Inch Sapphire Wafer CAS Number: 12138-09-9 Substrate Size: 2-Inch Sapphire Wafer Preparation Method: Chemical Vapor Deposition (CVD) Substrate Options: WS₂ films are grown directly on sapphire substrates. Custom transfer to other substrates is available upon request-please visit the Custom Products page or contact us for assistance. Fundamental Properties: Tungsten disulfide…
Tungsten Disulfide (WS₂) Film on 4-Inch Sapphire Wafer CAS Number: 12138-09-9 Substrate Size: 4-Inch Sapphire Wafer Preparation Method: Chemical Vapor Deposition (CVD) Substrate Options: WS₂ films are grown directly on sapphire substrates. Custom transfer to other substrates is available upon request-please visit the Custom Products page or contact us for assistance. Fundamental Properties: Tungsten disulfide…
Tungsten Disulfide (WS₂) Sputtering Target, 99.9% Purity, Circular (Price Upon Request) Nanostore’s Tungsten Disulfide (WS₂) sputtering target is a 99.9% purity transition-metal dichalcogenide ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work. Pricing is provided upon request…
Tungsten Ditelluride (WTe₂) Sputtering Target, 99.9% Purity, Circular (Price Upon Request) Nanostore’s Tungsten Ditelluride (WTe₂) sputtering target is a 99.9% purity transition-metal dichalcogenide PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work. Pricing is provided upon request because…
Tungsten Rhenium Alloy (W-Re) Sputtering Target, 99.99% Purity, Circular (Price Upon Request) Nanostore’s Tungsten Rhenium Alloy (W-Re) sputtering target is a 99.99% purity high-temperature refractory alloy PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling,…
Tungsten Titanium Alloy (WTi) Pellets, 99.99% Purity (Request Current Price) Nanostore Tungsten Titanium Alloy (WTi) pellets are alloy source materials supplied for thin-film deposition research, evaporation source loading, custom alloy preparation, and laboratory materials development. The pellet and piece formats are convenient for weighing, loading, and small-batch experimental workflows where material identity, purity selection, and…
Tungsten Titanium Alloy (WTi) Sputtering Target, 99.99% Purity, W:Ti = 90:10 wt%, Circular (Price Upon Request) Nanostore’s Tungsten Titanium Alloy (WTi) sputtering target is a 99.99% purity, w:ti = 90:10 wt% refractory metal alloy PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research,…
Tungsten Trioxide (WO₃) Evaporation Pellets, 99.99% Purity (Request Current Price) Nanostore Tungsten Trioxide (WO₃) evaporation pellets are compound source materials supplied for evaporation coating, thin-film deposition research, optical and functional films, and laboratory PVD process development. The pellet format is convenient for weighing, source loading, and small-batch experimental workflows where clean handling and controlled material…
Tungsten Trioxide (WO₃) Sputtering Target, 99.99% Purity, Circular (Price Upon Request) Nanostore’s Tungsten Trioxide (WO₃) sputtering target is a 99.99% purity transition-metal oxide ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work. Pricing is provided upon request…
Tungsten Trioxide (WO₃) Sputtering Target, 99.99% Purity, Oxygen-Deficient Dark Gray Grade, Circular (Price Upon Request) Nanostore’s Tungsten Trioxide (WO₃) sputtering target is a 99.99% purity, oxygen-deficient dark gray grade oxygen-deficient tungsten oxide PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and…
A U-shaped salt bridge that keeps the working and reference solutions in ionic contact while limiting mixing between half-cells.
Ultra High Purity Titanium Sheets (99.999%, 5N) – Research & Semiconductor Grade Short Description Ultra-high purity (99.999%, 5N) titanium foil engineered for specialized research, semiconductor processing, and high-sensitivity electrochemical applications. Clean metallic surface, precision thickness control, and laboratory-grade packaging. Full Product Description Overview Our 99.999% (5N) ultra-high purity titanium foil is produced from refined titanium…
Ultra-High-Dyne Aluminum Foil This ultra-high-dyne aluminum foil is designed for use as a cathode current collector in lithium-ion batteries. The material maintains a stable dyne level above 66, supporting slurry wettability, adhesion, surface cleanliness, and coating compatibility. Its mechanical strength and surface quality support use in cathode electrode fabrication. Standard Specifications Thickness: 12 ± 1…
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