Hexagonal Boron Nitride (h-BN) Grown on Copper Foil (10 cm x 10 cm)
CAS Number: 10043-11-5
Preparation Method: Hexagonal boron nitride (h-BN) films are grown on copper foils using a Chemical Vapor Deposition (CVD) process, resulting in quality and uniform layers. Morphology Options:
Monolayer
Few Layers (<10 layers, ~5 nm) Multilayer (>5 nm)
All options are available at the same price. For specific requirements, please contact us directly.
Substrate Options:
H-BN films are directly grown on copper foils, making them applicable to further transfer or direct applications. Custom transfer to other substrate materials is available upon request-please visit our Custom Products page or contact us for assistance.
Fundamental Properties:
Hexagonal boron nitride (h-BN) is a layered two-dimensional material with high chemical, thermal, and mechanical behavior. It is an electrical insulator with a wide bandgap (~5.9 eV), making it applicable for applications requiring dielectric properties. Key properties include:
Chemical behavior: High resistance to oxidation and chemical degradation.
Thermal behavior: Can withstand high temperatures, making it applicable to extreme environments.
Mechanical Strength: High strength and flexibility, permits consistent device assembly.
Wide Bandgap: High dielectric properties for use as an insulating layer.
Applications:
Electronics: Applicable as a dielectric layer or substrate for graphene and other 2D materials in specialized electronic devices.
Optoelectronics: Used in light-emitting devices and UV detectors.
Thermal Management: Applicable to standard thermal insulation and heat dissipation.
Sensors: Serves as a chemically consistent insulating material for gas and chemical sensors. Energy Applications: Utilized as a protective or insulating layer in energy storage and conversion devices.
| Option 1 | Few Layers (<10 layers, ~5 nm), Monolayer, Multilayer (>5 nm) |
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