Showing 49–64 of 233 results
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Price upon request
Copper Oxide (CuO) Sputtering Target, 99.9% Purity, Circular (Price Upon Request) ZHC LAB’s Copper Oxide (CuO) sputtering target is a 99.9% purity p-type oxide ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional…
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$1,098.44 – $1,574.58Price range: $1,098.44 through $1,574.58
Copper Selenide (CuSe) Sputtering Target, 99.9% Purity, Circular Nanostore’s Copper Selenide (CuSe) sputtering target is a 99.9% purity copper chalcogenide PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work. Key Features Source Material Supplied as 99.9% Purity for…
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Price upon request
Copper Sulfide (CuS) Sputtering Target, 99.99% Purity, Circular (Price Upon Request) ZHC LAB’s Copper Sulfide (CuS) sputtering target is a 99.99% purity chalcogenide ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency,…
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Price upon request
Copper Tin Selenide (CuSnSe) Sputtering Target, 99.99% Purity, Custom Composition, Circular (Price Upon Request) Nanostore’s Copper Tin Selenide (CuSnSe) sputtering target is a 99.99% purity, custom composition custom copper chalcogenide PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process…
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Price upon request
Cuprous Oxide (Cu₂O) Sputtering Target, 99.9% Purity, Circular (Price Upon Request) Nanostore’s Cuprous Oxide (Cu₂O) sputtering target is a 99.9% purity p-type oxide ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work. Pricing is provided upon request…
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Price upon request
Cuprous Selenide (Cu₂Se) Sputtering Target, 99.99% Purity, Circular (Price Upon Request) Nanostore’s Cuprous Selenide (Cu₂Se) sputtering target is a 99.99% purity copper chalcogenide PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work. Pricing is provided upon request because…
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Price upon request
Cuprous Sulfide (Cu₂S) Sputtering Target, 99.99% Purity, Circular (Price Upon Request) Nanostore’s Cuprous Sulfide (Cu₂S) sputtering target is a 99.99% purity chalcogenide ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work. Pricing is provided upon request because…
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Price upon request
Erbium Oxide (Er₂O₃) Sputtering Target, 99.99% Purity, Circular (Price Upon Request) Nanostore’s Erbium Oxide (Er₂O₃) sputtering target is a 99.99% purity rare-earth oxide ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work. Pricing for this material is…
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Price upon request
Europium Oxide (Eu₂O₃) Sputtering Target, 99.99% Purity, Circular (Price Upon Request) Nanostore’s Europium Oxide (Eu₂O₃) sputtering target is a 99.99% purity rare-earth oxide ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work. Pricing is provided upon request…
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Price upon request
Fluorine-Doped Tin Oxide (FTO) Sputtering Target, 99.99% Purity, SnO₂:F = 90:10 wt%, Circular (Price Upon Request) Nanostore’s Fluorine-Doped Tin Oxide (FTO) sputtering target is a 99.99% purity, sno2:f = 90:10 wt% transparent conductive oxide PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research,…
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Price upon request
Fluorine-Doped Tin Oxide (FTO) Sputtering Target, 99.99% Purity, SnO₂:F = 95:5 wt%, Circular (Price Upon Request) Nanostore’s Fluorine-Doped Tin Oxide (FTO) sputtering target is a 99.99% purity, sno2:f = 95:5 wt% transparent conductive oxide ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for…
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Price upon request
Gadolinium Oxide (Gd₂O₃) Sputtering Target, 99.99% Purity, Circular (Price Upon Request) Nanostore’s Gadolinium Oxide (Gd₂O₃) sputtering target is a 99.99% purity rare-earth oxide ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work. Pricing is provided upon request…
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Price upon request
Gallium Antimonide (GaSb) Sputtering Target, 99.99% Purity, Circular (Price Upon Request) Nanostore’s Gallium Antimonide (GaSb) sputtering target is a 99.99% purity III-V compound semiconductor PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work. Pricing is provided upon request…
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$2,926.42 – $3,344.09Price range: $2,926.42 through $3,344.09
Gallium Nitride (GaN) Sputtering Target, 99.99% (4N) Purity, Circular Gallium Nitride (GaN) sputtering target is a compound semiconductor PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where controlled handling, stated dimensions, and material identity are specified. Features…
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$680.78 – $1,670.64Price range: $680.78 through $1,670.64
Gallium Oxide (Ga₂O₃) Sputtering Target, 99.99% Purity, Circular Nanostore’s Gallium Oxide (Ga₂O₃) sputtering target is a 99.99% purity wide-bandgap oxide ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work. Key Features Source Material Supplied as 99.99% Purity…
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Price upon request
Gallium Sulfide (GaS) Sputtering Target, 99.9% Purity, Circular (Price Upon Request) ZHC LAB’s Gallium Sulfide (GaS) sputtering target is a 99.9% purity chalcogenide semiconductor ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional…
