Showing 1–16 of 233 results

  • Aluminum (Al) Sputtering Target, 99.999% (5N) Purity, Circular

    Aluminum (Al) Sputtering Target, 99.999% (5N) Purity, Circular

    Price range: $164.27 through $492.83

    Aluminum (Al) Sputtering Target, 99.999% (5N) Purity, Circular (Price Upon Request) Nanostore’s Aluminum (Al) sputtering target is a metallic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, stated dimensions, and material identity are specified….

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  • Aluminum (Al) Sputtering Target, 99.999% Purity, SEM Coating Grade, Circular

    Aluminum (Al) Sputtering Target, 99.999% Purity, SEM Coating Grade, Circular

    Price range: $190.72 through $221.35

    Aluminum (Al) Sputtering Target, 99.999% Purity, SEM Coating Grade, Circular Nanostore’s Aluminum (Al) sputtering target is a 99.999% purity, sem coating grade metal PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work. Key Features Source Material Supplied as…

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  • Aluminum Copper Alloy (AlCu) Sputtering Target, 99.999% Purity, Al:Cu = 95:5 at%, Circular (Price Upon Request)

    Aluminum Copper Alloy (AlCu) Sputtering Target, 99.999% Purity, Al:Cu = 95:5 at%, Circular (Price Upon Request)

    Price upon request

    Aluminum Copper Alloy (AlCu) Sputtering Target, 99.999% Purity, Al:Cu = 95:5 at%, Circular (Price Upon Request) Nanostore’s Aluminum Copper Alloy (AlCu) sputtering target is a 99.999% purity, al:cu = 95:5 at% aluminum alloy PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development,…

  • Aluminum Diboride (AlB2) Sputtering Target, 99.5% Purity, Circular

    Aluminum Diboride (AlB₂) Sputtering Target, 99.5% Purity, Circular

    Price range: $1,099.84 through $2,061.86

    Aluminum Diboride (AlB₂) Sputtering Target, 99.5% Purity, Circular Nanostore’s Aluminum Diboride (AlB₂) sputtering target is a 99.5% purity boride ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work. Key Features Source Material Supplied as 99.5% Purity for…

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  • Aluminum Nitride (AlN) Sputtering Target, 99.9% Purity, Circular

    Aluminum Nitride (AlN) Sputtering Target, 99.9% Purity, Circular

    Price range: $572.19 through $1,014.91

    Aluminum Nitride (AlN) Sputtering Target, 99.9% Purity, Circular Nanostore’s Aluminum Nitride (AlN) sputtering target is a 99.9% purity nitride ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work. Key Features Source Material Supplied as 99.9% Purity for…

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  • Aluminum Oxide (Al2O3) Sputtering Target, 99.99% Purity, Circular

    Aluminum Oxide (Al₂O₃) Sputtering Target, 99.99% Purity, Circular

    Price range: $453.85 through $1,853.02

    Aluminum Oxide (Al₂O₃) Sputtering Target, 99.99% Purity, Circular Nanostore’s Aluminum Oxide (Al₂O₃) sputtering target is a 99.99% purity oxide ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work. Key Features Source Material Supplied as 99.99% Purity for…

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  • Aluminum-Doped Zinc Oxide (AZO) Sputtering Target, 99.99% Purity, ZnO:Al2O3 = 98:2 wt%, Circular

    Aluminum-Doped Zinc Oxide (AZO) Sputtering Target, 99.99% Purity, ZnO:Al₂O₃ = 98:2 wt%, Circular

    Price range: $267.29 through $555.48

    Aluminum-Doped Zinc Oxide (AZO) Sputtering Target, 99.99% Purity, ZnO:Al₂O₃ = 98:2 wt%, Circular Nanostore’s Aluminum-Doped Zinc Oxide (AZO) sputtering target is a 99.99% purity, zno:al2o3 = 98:2 wt% transparent conductive oxide ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and…

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  • Antimony (Sb) Sputtering Target, 99.99% Purity, Circular (Price Upon Request)

    Antimony (Sb) Sputtering Target, 99.99% Purity, Circular (Price Upon Request)

    Price upon request

    Antimony (Sb) Sputtering Target, 99.99% Purity, Circular (Price Upon Request) ZHC LAB’s Antimony (Sb) sputtering target is a 99.99% purity high-purity metalloid material PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency, and…

  • Antimony Selenide (Sb2Se3) Sputtering Target, 99.99% Purity, Circular (Price Upon Request)

    Antimony Selenide (Sb₂Se₃) Sputtering Target, 99.99% Purity, Circular (Price Upon Request)

    Price upon request

    Antimony Selenide (Sb₂Se₃) Sputtering Target, 99.99% Purity, Circular (Price Upon Request) Nanostore’s Antimony Selenide (Sb₂Se₃) sputtering target is a 99.99% purity chalcogenide semiconductor ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work. Pricing is provided upon request…

  • Antimony Telluride (Sb2Te3) Sputtering Target, 99.99% Purity, Circular (Price Upon Request)

    Antimony Telluride (Sb₂Te₃) Sputtering Target, 99.99% Purity, Circular (Price Upon Request)

    Price upon request

    Antimony Telluride (Sb₂Te₃) Sputtering Target, 99.99% Purity, Circular (Price Upon Request) Nanostore’s Antimony Telluride (Sb₂Te₃) sputtering target is a 99.99% purity chalcogenide semiconductor ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work. Pricing is provided upon request…

  • Barium Strontium Titanate (BST) Sputtering Target, 99.99% Purity, Circular (Price Upon Request)

    Barium Strontium Titanate (BST) Sputtering Target, 99.99% Purity, Circular (Price Upon Request)

    Price upon request

    Barium Strontium Titanate (BST) Sputtering Target, 99.99% Purity, Circular (Price Upon Request) Nanostore’s Barium Strontium Titanate (BST) sputtering target is a 99.99% purity ferroelectric oxide ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work. Pricing is provided…

  • Barium Titanate (BaTiO3) Sputtering Target, 99.99% Purity, Circular (Price Upon Request)

    Barium Titanate (BaTiO₃) Sputtering Target, 99.99% Purity, Circular (Price Upon Request)

    Price upon request

    Barium Titanate (BaTiO₃) Sputtering Target, 99.99% Purity, Circular (Price Upon Request) Nanostore’s Barium Titanate (BaTiO₃) sputtering target is a 99.99% purity ferroelectric oxide ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work. Pricing for this material is…

  • Bismuth (Bi) Sputtering Target, 99.99% Purity, Circular

    Bismuth (Bi) Sputtering Target, 99.99% Purity, Circular

    Price range: $231.09 through $559.66

    Bismuth (Bi) Sputtering Target, 99.99% Purity, Circular Nanostore’s Bismuth (Bi) sputtering target is a 99.99% purity metallic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency, and consistent material identity are important. Key…

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  • Bismuth Antimony Telluride (BiSbTe) Sputtering Target, 99.99% Purity, Circular (Price Upon Request)

    Bismuth Antimony Telluride (BiSbTe) Sputtering Target, 99.99% Purity, Circular (Price Upon Request)

    Price upon request

    Bismuth Antimony Telluride (BiSbTe) Sputtering Target, 99.99% Purity, Circular (Price Upon Request) Nanostore’s Bismuth Antimony Telluride (BiSbTe) sputtering target is a 99.99% purity thermoelectric chalcogenide PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional…

  • Bismuth Ferrite (BiFeO3) Sputtering Target, 99.9% Purity, Circular

    Bismuth Ferrite (BiFeO₃) Sputtering Target, 99.9% Purity, Circular

    Price range: $775.45 through $1,252.98

    Bismuth Ferrite (BiFeO₃) Sputtering Target, 99.9% Purity, Circular Nanostore’s Bismuth Ferrite (BiFeO₃) sputtering target is a 99.9% purity multiferroic oxide ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work. Key Features Source Material Supplied as 99.9% Purity…

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  • Bismuth Iron Garnet (Bi3Fe5O12) Sputtering Target, 99.99% (4N) Purity, Circular (Price Upon Request)

    Bismuth Iron Garnet (Bi₃Fe₅O₁₂) Sputtering Target, 99.99% (4N) Purity, Circular (Price Upon Request)

    Price upon request

    Bismuth Iron Garnet (Bi₃Fe₅O₁₂) Sputtering Target, 99.99% (4N) Purity, Circular (Price Upon Request) The Bismuth Iron Garnet (Bi₃Fe₅O₁₂) sputtering target is a magneto-optic oxide PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where controlled handling, stated dimensions,…