Showing 97–112 of 233 results
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Price upon request
Iridium Manganese Alloy (IrMn) Sputtering Target, 99.9% Purity, Circular (Price Upon Request) ZHC LAB’s Iridium Manganese Alloy (IrMn) sputtering target is a 99.9% purity magnetic alloy PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling,…
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$204.25 – $578.09Price range: $204.25 through $578.09
Iron (Fe) Sputtering Target, 99.95% Purity, Circular Nanostore’s Iron (Fe) sputtering target is a 99.95% purity ferromagnetic metallic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency, and consistent material identity are important….
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$1,686.12
Iron Chromium Aluminum Alloy (FeCrAl) Sputtering Target, 99.9% Purity, Circular ZHC LAB’s Iron Chromium Aluminum Alloy (FeCrAl) sputtering target is a 99.9% purity high-temperature resistance alloy PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling,…
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Price upon request
Iron Gallium Alloy (FeGa) Sputtering Target, 99.99% Purity, Fe:Ga = 80:20 at%, Circular (Price Upon Request) ZHC LAB’s Iron Gallium Alloy (FeGa) sputtering target is a 99.99% purity, fe:ga = 80:20 at% magnetostrictive alloy PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research,…
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Price upon request
Iron Gallium Boron Alloy (FeGaB) Sputtering Target, Fe:Ga:B = 7:2:1 at%, Fe:Ga:B = 70.4:17.6:12 at%, Circular (Price Upon Request) ZHC LAB’s Iron Gallium Boron Alloy (FeGaB) sputtering target is a fe:ga:b = 7:2:1 at%, fe:ga:b = 70.4:17.6:12 at% magnetostrictive and magnetic alloy PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It…
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Price upon request
Iron Manganese Alloy (FeMn) Sputtering Target, 99.9% Purity, Fe:Mn = 50:50 at%, Circular (Price Upon Request) ZHC LAB’s Iron Manganese Alloy (FeMn) sputtering target is a 99.9% purity, fe:mn = 50:50 at% magnetic transition-metal alloy PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for…
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$763.08 – $1,792.11Price range: $763.08 through $1,792.11
Iron(II,III) Oxide (Fe₃O₄) Sputtering Target, 99.9% Purity, Circular Nanostore’s Iron(II,III) Oxide (Fe₃O₄) sputtering target is a 99.9% purity magnetic oxide ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work. Key Features Source Material Supplied as 99.9% Purity…
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$994.32 – $1,743.94Price range: $994.32 through $1,743.94
Iron(III) Oxide (Fe₂O₃) Sputtering Target, 99.99% Purity, Circular Nanostore’s Iron(III) Oxide (Fe₂O₃) sputtering target is a 99.99% purity oxide ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work. Key Features Source Material Supplied as 99.99% Purity for…
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$1,751.64 – $2,312.41Price range: $1,751.64 through $2,312.41
Lanthanum Aluminate (LaAlO₃) Sputtering Target, 99.9% Purity, Circular Nanostore’s Lanthanum Aluminate (LaAlO₃) sputtering target is a 99.9% purity perovskite aluminate oxide PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work. Key Features Source Material Supplied as 99.9% Purity…
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$1,073.33 – $1,684.20Price range: $1,073.33 through $1,684.20
Lanthanum Hexaboride (LaB₆) Sputtering Target, 99.9% Purity, Circular ZHC LAB’s Lanthanum Hexaboride (LaB₆) sputtering target is a 99.9% purity refractory boride ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency, and specified…
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Price upon request
Lanthanum Lithium Titanate (La₀.₅Li₀.₅TiO₃) Sputtering Target, 99.99% Purity, Circular (Price Upon Request) Nanostore’s Lanthanum Lithium Titanate (La₀.₅Li₀.₅TiO₃) sputtering target is a 99.99% purity lithium lanthanum titanate ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work. Pricing is…
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$398.87 – $610.85Price range: $398.87 through $610.85
Lead (Pb) Sputtering Target, 99.995%-99.999% Purity, Circular ZHC LAB’s Lead (Pb) sputtering target is a 99.995%-99.999% purity high-purity soft metal PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency, and specified material identity…
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Price upon request
Lead Telluride (PbTe) Sputtering Target, 99.999% (5N) Purity, Circular (Price Upon Request) Lead Telluride (PbTe) sputtering target is a narrow-bandgap compound semiconductor PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where controlled handling, stated dimensions, and material…
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Price upon request
Lead Zirconate Titanate (PZT) Sputtering Target, 99.99% Purity, PbZr₀.₅₂Ti₀.₄₈O₃, Circular (Price Upon Request) Nanostore’s Lead Zirconate Titanate (PZT) sputtering target is a 99.99% purity, pbzr0.52ti0.48o3 piezoelectric ferroelectric ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work. Pricing…
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$1,156.19 – $2,705.52Price range: $1,156.19 through $2,705.52
Lithium Cobalt Oxide (LiCoO₂) Sputtering Target, 99.9% Purity, Circular (Price Upon Request) Nanostore’s Lithium Cobalt Oxide (LiCoO₂) sputtering target is a 99.9% purity battery cathode oxide ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work. Pricing is…
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$1,254.47 – $1,849.92Price range: $1,254.47 through $1,849.92
Lithium Iron Phosphate (LiFePO₄) Sputtering Target, 99.9%-99.99% Purity, Circular Nanostore’s Lithium Iron Phosphate (LiFePO₄) sputtering target is a 99.9%-99.99% purity battery cathode phosphate ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work. Key Features Source Material Supplied…
