Showing 1–16 of 233 results
-
$227.37 – $682.15Price range: $227.37 through $682.15
Aluminum (Al) Sputtering Target, 99.999% (5N) Purity, Circular (Price Upon Request) Nanostore’s Aluminum (Al) sputtering target is a metallic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, stated dimensions, and material identity are specified….
-
$263.98 – $306.38Price range: $263.98 through $306.38
Aluminum (Al) Sputtering Target, 99.999% Purity, SEM Coating Grade, Circular Nanostore’s Aluminum (Al) sputtering target is a 99.999% purity, sem coating grade metal PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work. Key Features Source Material Supplied as…
-
Price upon request
Aluminum Copper Alloy (AlCu) Sputtering Target, 99.999% Purity, Al:Cu = 95:5 at%, Circular (Price Upon Request) Nanostore’s Aluminum Copper Alloy (AlCu) sputtering target is a 99.999% purity, al:cu = 95:5 at% aluminum alloy PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development,…
-
$1,522.33 – $2,853.90Price range: $1,522.33 through $2,853.90
Aluminum Diboride (AlB₂) Sputtering Target, 99.5% Purity, Circular Nanostore’s Aluminum Diboride (AlB₂) sputtering target is a 99.5% purity boride ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work. Key Features Source Material Supplied as 99.5% Purity for…
-
$791.99 – $1,404.78Price range: $791.99 through $1,404.78
Aluminum Nitride (AlN) Sputtering Target, 99.9% Purity, Circular Nanostore’s Aluminum Nitride (AlN) sputtering target is a 99.9% purity nitride ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work. Key Features Source Material Supplied as 99.9% Purity for…
-
$628.19 – $2,564.85Price range: $628.19 through $2,564.85
Aluminum Oxide (Al₂O₃) Sputtering Target, 99.99% Purity, Circular Nanostore’s Aluminum Oxide (Al₂O₃) sputtering target is a 99.99% purity oxide ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work. Key Features Source Material Supplied as 99.99% Purity for…
-
$369.97 – $768.86Price range: $369.97 through $768.86
Aluminum-Doped Zinc Oxide (AZO) Sputtering Target, 99.99% Purity, ZnO:Al₂O₃ = 98:2 wt%, Circular Nanostore’s Aluminum-Doped Zinc Oxide (AZO) sputtering target is a 99.99% purity, zno:al2o3 = 98:2 wt% transparent conductive oxide ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and…
-
Price upon request
Antimony (Sb) Sputtering Target, 99.99% Purity, Circular (Price Upon Request) ZHC LAB’s Antimony (Sb) sputtering target is a 99.99% purity high-purity metalloid material PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency, and…
-
Price upon request
Antimony Selenide (Sb₂Se₃) Sputtering Target, 99.99% Purity, Circular (Price Upon Request) Nanostore’s Antimony Selenide (Sb₂Se₃) sputtering target is a 99.99% purity chalcogenide semiconductor ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work. Pricing is provided upon request…
-
Price upon request
Antimony Telluride (Sb₂Te₃) Sputtering Target, 99.99% Purity, Circular (Price Upon Request) Nanostore’s Antimony Telluride (Sb₂Te₃) sputtering target is a 99.99% purity chalcogenide semiconductor ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work. Pricing is provided upon request…
-
Price upon request
Barium Strontium Titanate (BST) Sputtering Target, 99.99% Purity, Circular (Price Upon Request) Nanostore’s Barium Strontium Titanate (BST) sputtering target is a 99.99% purity ferroelectric oxide ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work. Pricing is provided…
-
Price upon request
Barium Titanate (BaTiO₃) Sputtering Target, 99.99% Purity, Circular (Price Upon Request) Nanostore’s Barium Titanate (BaTiO₃) sputtering target is a 99.99% purity ferroelectric oxide ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work. Pricing for this material is…
-
$319.87 – $774.64Price range: $319.87 through $774.64
Bismuth (Bi) Sputtering Target, 99.99% Purity, Circular Nanostore’s Bismuth (Bi) sputtering target is a 99.99% purity metallic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency, and consistent material identity are important. Key…
-
Price upon request
Bismuth Antimony Telluride (BiSbTe) Sputtering Target, 99.99% Purity, Circular (Price Upon Request) Nanostore’s Bismuth Antimony Telluride (BiSbTe) sputtering target is a 99.99% purity thermoelectric chalcogenide PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional…
-
$1,073.33 – $1,734.30Price range: $1,073.33 through $1,734.30
Bismuth Ferrite (BiFeO₃) Sputtering Target, 99.9% Purity, Circular Nanostore’s Bismuth Ferrite (BiFeO₃) sputtering target is a 99.9% purity multiferroic oxide ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work. Key Features Source Material Supplied as 99.9% Purity…
-
Price upon request
Bismuth Iron Garnet (Bi₃Fe₅O₁₂) Sputtering Target, 99.99% (4N) Purity, Circular (Price Upon Request) The Bismuth Iron Garnet (Bi₃Fe₅O₁₂) sputtering target is a magneto-optic oxide PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where controlled handling, stated dimensions,…
