Showing 97–112 of 233 results
-
Price upon request
Iridium Manganese Alloy (IrMn) Sputtering Target, 99.9% Purity, Circular (Price Upon Request) ZHC LAB’s Iridium Manganese Alloy (IrMn) sputtering target is a 99.9% purity magnetic alloy PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling,…
-
$205.37 – $581.28Price range: $205.37 through $581.28
Iron (Fe) Sputtering Target, 99.95% Purity, Circular Nanostore’s Iron (Fe) sputtering target is a 99.95% purity ferromagnetic metallic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency, and consistent material identity are important….
-
$1,695.44
Iron Chromium Aluminum Alloy (FeCrAl) Sputtering Target, 99.9% Purity, Circular ZHC LAB’s Iron Chromium Aluminum Alloy (FeCrAl) sputtering target is a 99.9% purity high-temperature resistance alloy PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling,…
-
Price upon request
Iron Gallium Alloy (FeGa) Sputtering Target, 99.99% Purity, Fe:Ga = 80:20 at%, Circular (Price Upon Request) ZHC LAB’s Iron Gallium Alloy (FeGa) sputtering target is a 99.99% purity, fe:ga = 80:20 at% magnetostrictive alloy PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research,…
-
Price upon request
Iron Gallium Boron Alloy (FeGaB) Sputtering Target, Fe:Ga:B = 7:2:1 at%, Fe:Ga:B = 70.4:17.6:12 at%, Circular (Price Upon Request) ZHC LAB’s Iron Gallium Boron Alloy (FeGaB) sputtering target is a fe:ga:b = 7:2:1 at%, fe:ga:b = 70.4:17.6:12 at% magnetostrictive and magnetic alloy PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It…
-
Price upon request
Iron Manganese Alloy (FeMn) Sputtering Target, 99.9% Purity, Fe:Mn = 50:50 at%, Circular (Price Upon Request) ZHC LAB’s Iron Manganese Alloy (FeMn) sputtering target is a 99.9% purity, fe:mn = 50:50 at% magnetic transition-metal alloy PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for…
-
$767.30 – $1,802.02Price range: $767.30 through $1,802.02
Iron(II,III) Oxide (Fe₃O₄) Sputtering Target, 99.9% Purity, Circular Nanostore’s Iron(II,III) Oxide (Fe₃O₄) sputtering target is a 99.9% purity magnetic oxide ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work. Key Features Source Material Supplied as 99.9% Purity…
-
$999.82 – $1,753.57Price range: $999.82 through $1,753.57
Iron(III) Oxide (Fe₂O₃) Sputtering Target, 99.99% Purity, Circular Nanostore’s Iron(III) Oxide (Fe₂O₃) sputtering target is a 99.99% purity oxide ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work. Key Features Source Material Supplied as 99.99% Purity for…
-
$1,761.32 – $2,325.19Price range: $1,761.32 through $2,325.19
Lanthanum Aluminate (LaAlO₃) Sputtering Target, 99.9% Purity, Circular Nanostore’s Lanthanum Aluminate (LaAlO₃) sputtering target is a 99.9% purity perovskite aluminate oxide PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work. Key Features Source Material Supplied as 99.9% Purity…
-
$1,079.26 – $1,693.51Price range: $1,079.26 through $1,693.51
Lanthanum Hexaboride (LaB₆) Sputtering Target, 99.9% Purity, Circular ZHC LAB’s Lanthanum Hexaboride (LaB₆) sputtering target is a 99.9% purity refractory boride ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency, and specified…
-
Price upon request
Lanthanum Lithium Titanate (La₀.₅Li₀.₅TiO₃) Sputtering Target, 99.99% Purity, Circular (Price Upon Request) Nanostore’s Lanthanum Lithium Titanate (La₀.₅Li₀.₅TiO₃) sputtering target is a 99.99% purity lithium lanthanum titanate ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work. Pricing is…
-
$401.08 – $614.22Price range: $401.08 through $614.22
Lead (Pb) Sputtering Target, 99.995%-99.999% Purity, Circular ZHC LAB’s Lead (Pb) sputtering target is a 99.995%-99.999% purity high-purity soft metal PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency, and specified material identity…
-
Price upon request
Lead Telluride (PbTe) Sputtering Target, 99.999% (5N) Purity, Circular (Price Upon Request) Lead Telluride (PbTe) sputtering target is a narrow-bandgap compound semiconductor PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where controlled handling, stated dimensions, and material…
-
Price upon request
Lead Zirconate Titanate (PZT) Sputtering Target, 99.99% Purity, PbZr₀.₅₂Ti₀.₄₈O₃, Circular (Price Upon Request) Nanostore’s Lead Zirconate Titanate (PZT) sputtering target is a 99.99% purity, pbzr0.52ti0.48o3 piezoelectric ferroelectric ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work. Pricing…
-
$1,162.58 – $2,720.47Price range: $1,162.58 through $2,720.47
Lithium Cobalt Oxide (LiCoO₂) Sputtering Target, 99.9% Purity, Circular (Price Upon Request) Nanostore’s Lithium Cobalt Oxide (LiCoO₂) sputtering target is a 99.9% purity battery cathode oxide ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work. Pricing is…
-
$1,261.41 – $1,860.15Price range: $1,261.41 through $1,860.15
Lithium Iron Phosphate (LiFePO₄) Sputtering Target, 99.9%-99.99% Purity, Circular Nanostore’s Lithium Iron Phosphate (LiFePO₄) sputtering target is a 99.9%-99.99% purity battery cathode phosphate ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work. Key Features Source Material Supplied…
