Showing 193–208 of 233 results
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$543.40 – $942.29Price range: $543.40 through $942.29
Titanium Diboride (TiB₂) Sputtering Target, 99.9% Purity, Circular Nanostore’s Titanium Diboride (TiB₂) sputtering target is a 99.9% purity boride ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work. Key Features Source Material Supplied as 99.9% Purity for…
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$379.60 – $774.64Price range: $379.60 through $774.64
Titanium Dioxide (TiO₂) Sputtering Target, 99.99% Purity, Circular Nanostore’s Titanium Dioxide (TiO₂) sputtering target is a 99.99% purity oxide ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work. Key Features Source Material Supplied as 99.99% Purity for…
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$1,352.75 – $2,312.41Price range: $1,352.75 through $2,312.41
Titanium Disilicide (TiSi₂) Sputtering Target, 99.9% Purity, Circular Nanostore’s Titanium Disilicide (TiSi₂) sputtering target is a 99.9% purity metal silicide PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work. Key Features Source Material Supplied as 99.9% Purity for…
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$1,352.75 – $2,262.30Price range: $1,352.75 through $2,262.30
Titanium Monoxide (TiO) Sputtering Target, 99.9% Purity, Circular ZHC LAB’s Titanium Monoxide (TiO) sputtering target is a 99.9% purity titanium monoxide ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency, and specified…
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$495.23 – $1,583.99Price range: $495.23 through $1,583.99
Titanium Nitride (TiN) Sputtering Target, 99.9% Purity, Circular ZHC LAB’s Titanium Nitride (TiN) sputtering target is a 99.9% purity nitride ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency, and specified material…
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$1,113.80 – $2,015.65Price range: $1,113.80 through $2,015.65
Titanium Pentoxide (Ti₃O₅) Sputtering Target, 99.99% Purity, Circular Nanostore’s Titanium Pentoxide (Ti₃O₅) sputtering target is a 99.99% purity titanium oxide ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work. Key Features Source Material Supplied as 99.99% Purity…
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$1,520.40 – $1,684.20Price range: $1,520.40 through $1,684.20
Titanium Silicon Alloy (TiSi) Sputtering Target, 99.9% Purity, Ti:Si = 1:1 at%, Circular ZHC LAB’s Titanium Silicon Alloy (TiSi) sputtering target is a 99.9% purity, ti:si = 1:1 at% binary alloy and silicide research PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research,…
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Price upon request
Titanium Silicon Molybdenum Alloy (TiSiMo) Sputtering Target, 99.9% Purity, Ti:Si:Mo = 1:1:2 at%, Circular (Price Upon Request) ZHC LAB’s Titanium Silicon Molybdenum Alloy (TiSiMo) sputtering target is a 99.9% purity, ti:si:mo = 1:1:2 at% ternary alloy PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats…
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Price upon request
Titanium Silicon Tantalum Alloy (TiSiTa) Sputtering Target, 99.9% Purity, Ti:Si:Ta = 1:1:1 at%, Circular (Price Upon Request) ZHC LAB’s Titanium Silicon Tantalum Alloy (TiSiTa) sputtering target is a 99.9% purity, ti:si:ta = 1:1:1 at% ternary alloy PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats…
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$1,485.71 – $2,740.21Price range: $1,485.71 through $2,740.21
Titanium Telluride (TiTe₂) Sputtering Target, 99.9% Purity, Circular Nanostore’s Titanium Telluride (TiTe₂) sputtering target is a 99.9% purity transition-metal chalcogenide ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work. Key Features Source Material Supplied as 99.9% Purity…
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$942.29 – $2,156.32Price range: $942.29 through $2,156.32
Titanium(III) Oxide (Ti₂O₃) Sputtering Target, 99.9% Purity, Circular Nanostore’s Titanium(III) Oxide (Ti₂O₃) sputtering target is a 99.9% purity titanium oxide ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work. Key Features Source Material Supplied as 99.9% Purity…
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$202.32 – $2,855.83Price range: $202.32 through $2,855.83
Tungsten (W) Sputtering Target, 99.95%-99.999% Purity, Circular (Price Upon Request) Nanostore’s Tungsten (W) sputtering target is a 99.95%-99.999% purity refractory metal PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency, and consistent material…
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Price upon request
Tungsten Carbide (WC) Sputtering Target, 99.9% Purity, Circular (Price Upon Request) Nanostore’s Tungsten Carbide (WC) sputtering target is a 99.9% purity carbide ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work. Pricing is provided upon request because…
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Price upon request
Tungsten Disilicide (WSi₂) Sputtering Target, 99.9% Purity, Circular (Price Upon Request) Nanostore’s Tungsten Disilicide (WSi₂) sputtering target is a 99.9% purity refractory metal silicide PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work. Pricing is provided upon request…
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$1,803.67 – $3,975.43Price range: $1,803.67 through $3,975.43
Tungsten Disulfide (WS₂) Sputtering Target, 99.9% Purity, Circular (Price Upon Request) Nanostore’s Tungsten Disulfide (WS₂) sputtering target is a 99.9% purity transition-metal dichalcogenide ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work. Pricing is provided upon request…
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Price upon request
Tungsten Ditelluride (WTe₂) Sputtering Target, 99.9% Purity, Circular (Price Upon Request) Nanostore’s Tungsten Ditelluride (WTe₂) sputtering target is a 99.9% purity transition-metal dichalcogenide PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work. Pricing is provided upon request because…
