Showing 1041–1056 of 1232 results
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$82.13 – $366.14Price range: $82.13 through $366.14
Thermal SiO₂ on N-Type (Phosphorus-Doped) Si (100) Wafers Overview Our thermal silicon dioxide (SiO₂) wafers are fabricated using high-temperature thermal oxidation on N-type (phosphorus-doped) Si (100) substrates with a resistivity range of 1–10 Ω·cm. Thermally grown oxide has consistent film density, high thickness uniformity, low interface trap density, and high dielectric strength compared to deposited…
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$82.13 – $366.14Price range: $82.13 through $366.14
Thermal SiO₂ on P-Type (Boron-Doped) Si (100) Wafers Overview Our thermal silicon dioxide (SiO₂) wafers are fabricated using high-temperature thermal oxidation on P-type (boron-doped) Si (100) substrates. Available resistivity ranges include 1–10 Ω·cm and heavily doped 0.001–0.005 Ω·cm options. Thermally grown SiO₂ has consistent film density, high dielectric strength, and a consistent Si/SiO₂ interface compared…
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$82.13 – $349.43Price range: $82.13 through $349.43
Thermal SiO₂ on Undoped Si (100) Wafers Overview Our thermal silicon dioxide (SiO₂) wafers are fabricated using high-temperature dry/wet thermal oxidation on undoped Si (100) substrates. Thermal oxide has consistent film density, high uniformity, low defect density, and consistent electrical insulation compared to deposited oxide films. These wafers are used in semiconductor research, MOS structure…
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$317.41
Thermosensitive High-Surface-Area Double-Sided Carbon-Coated Aluminum Foil for Dry-Process Electrodes The material is designed as a current collector for dry-process electrodes. It consists of an aluminum foil substrate coated on both sides with a thermosensitive, high-surface-area carbon layer. The coating provides conductivity, interfacial contact, and electrode stability under dry-process fabrication conditions. Specifications Substrate thickness: 14 µm…
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$350.82
Thermosensitive High-Surface-Area Double-Sided Carbon-Coated Copper Foil for Dry-Process Electrodes The material is a copper-foil current collector intended for dry-process electrode fabrication. The foil has a thermosensitive, high-surface-area carbon coating applied to both sides, providing interfacial contact and coating adhesion used for dry electrode processing. Customized widths and single-/double-sided coating configurations are available upon request. Application…
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$1,809.88
Thin-film optical spectrum electrochemical cell with electrode, in 0.5mm or 1mm slit widths for spectroelectrochemistry.
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$91.89 – $595.87Price range: $91.89 through $595.87
Borosilicate glass and PTFE three-electrode cell, sealed or unsealed, for routine voltammetry from room temperature to 60°C.
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Price upon request
Thulium Iron Garnet (Tm₃Fe₅O₁₂) Sputtering Target, Stoichiometric Composition, Circular (Price Upon Request) Nanostore’s Thulium Iron Garnet (Tm₃Fe₅O₁₂) sputtering target is a stoichiometric composition rare-earth iron garnet ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work. Pricing is…
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Price upon request
Thulium Oxide (Tm₂O₃) Evaporation Pellets, 99.95% Purity (Request Current Price) Nanostore Thulium Oxide (Tm₂O₃) evaporation pellets are compound source materials supplied for evaporation coating, thin-film deposition research, optical and functional films, and laboratory PVD process development. The pellet format is convenient for weighing, source loading, and small-batch experimental workflows where clean handling and controlled material…
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Price upon request
Thulium Oxide (Tm₂O₃) Sputtering Target, 99.99% Purity, Circular (Price Upon Request) Nanostore’s Thulium Oxide (Tm₂O₃) sputtering target is a 99.99% purity rare-earth oxide ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work. Pricing is provided upon request…
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Price upon request
Tin (Sn) Pellets And Pieces, 99.99%-99.9999% Purity (Request Current Price) Nanostore Tin (Sn) pellets and pieces are source materials supplied for thin-film deposition research, evaporation source loading, alloy preparation, and laboratory materials development. The pellet and piece formats are convenient for weighing, loading, and small-batch experimental workflows where material identity, purity selection, and clean handling…
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$125.29 – $710.02Price range: $125.29 through $710.02
Tin (Sn) Sputtering Target, 99.999% (5N) Purity, Circular (Price Upon Request) Tin (Sn) sputtering target is a metallic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, stated dimensions, and material identity are specified. Pricing…
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Price upon request
Tin (Sn) Wire, 99.99% Purity (Request Current Price) Tin (Sn) wire is a thin-film and materials-research source format supplied for PVD source loading, evaporation-related workflows, filament or wire studies, alloy preparation, and laboratory materials development. The wire and rod formats support cutting and weighing, fixture loading, and small-batch experimental work where material identity, purity, and…
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$793.55 – $2,840.11Price range: $793.55 through $2,840.11
Tin Dioxide (SnO₂) Sputtering Target, 99.99% Purity, Circular (Price Upon Request) Nanostore’s Tin Dioxide (SnO₂) sputtering target is a 99.99% purity transparent conductive oxide ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work. Pricing is provided upon…
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$598.64
Tin Diselenide (SnSe₂) CAS Number: 20770-09-6 Substrate Size: 1 cm x 1 cm Preparation Method: Chemical Vapor Deposition (CVD) Substrate Options: SnSe₂ films are directly grown on sapphire substrates. Custom transfer to other substrates is available upon request; please visit Custom Products page or contact us for assistance. Fundamental Properties: Tin diselenide (SnSe₂) is a…
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Price upon request
Tin Diselenide (SnSe₂) Sputtering Target, 99.99% Purity, Circular (Price Upon Request) Nanostore’s Tin Diselenide (SnSe₂) sputtering target is a 99.99% purity chalcogenide semiconductor ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work. Pricing is provided upon request…
