Nickel-Coated Silicon Substrates (Ni on Si (100))
Ni-Coated Si

Nickel-Coated Silicon Substrates (Ni on Si (100))

Price range: $43.14 through $126.68

Select an option to request a quote

Nickel-Coated Silicon Substrates (Ni on Si (100))

Overview
Our nickel-coated silicon substrates are precision-cut from research-grade Ni thin film wafers fabricated on Si (100) substrates using high-vacuum magnetron sputtering.

Nickel films are used in alkaline electrolysis, oxygen evolution reaction (OER), hydrogen evolution reaction (HER), and electrode development due to their high catalytic activity and corrosion resistance.

These small-format substrates are applicable for laboratory-scale electrochemical testing and materials research.

Layer Structure
Ni (Nickel layer)
Si (100) substrate

Optional adhesion layer available upon request:
Ti (5 nm)

Available Sizes
5 × 5 mm
10 × 10 mm
15 × 15 mm

Recommended Nickel Thickness
100 nm – Recommended for general electrochemical research
200 nm – Recommended for modified durability
500 nm – Thick conductive layer for long-term testing

Substrate Specifications
Orientation: Si (100)
Doping: N-type, 1–10 Ω·cm resistivity
Surface finish: Single-side polished (SSP)

Deposition Process
High-vacuum magnetron sputtering
Controlled thickness uniformity
Precision wafer dicing
Clean-room fits handling

Applications
Oxygen evolution reaction (OER)
Hydrogen evolution reaction (HER)
Electrochemical catalysis research
Electrode development
Energy storage research
Electroplating studies

Quality & Packaging
Uniform film thickness control
Research-grade surface quality
Protective packaging to minimize oxidation exposure

Custom sizes and thicknesses available upon request.

Option 1

10 × 10 mm Si | 100 nm Ni, 10 × 10 mm Si | 200 nm Ni, 10 × 10 mm Si | 500 nm Ni, 15 × 15 mm Si | 100 nm Ni, 15 × 15 mm Si | 200 nm Ni, 5 × 5 mm Si | 100 nm Ni, 5 × 5 mm Si | 200 nm Ni

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