Nickel Chromium Alloy (NiCr) Sputtering Target, 99.9% Purity, Ni:Cr = 80:20, Circular (Price Upon Request)

Nickel Chromium Alloy (NiCr) Sputtering Target, 99.9% Purity, Ni:Cr = 80:20, Circular (Price Upon Request)

Nanostore’s Nickel Chromium Alloy (NiCr) sputtering target is a 99.9% purity, ni:cr = 80:20 resistive alloy PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work. Pricing is provided upon request because final cost depends on selected dimensions and current material market conditions.

Key Features

Source Material
Supplied as 99.9% Purity, Ni:Cr = 80:20 for thin-film workflows.

Circular Target Formats
Available in circular diameters including 1.97 inch diameter (50 mm), 2 inch diameter (50.8 mm), 2.36 inch diameter (60 mm), 3 inch diameter (76.2 mm), 3.15 inch diameter (80 mm), 4 inch diameter (101.6 mm), 3.94 inch diameter (100 mm). Thickness and mounting options include 3 mm thick, depending on selected configuration.

Controlled Processing and Inspection
Target preparation may include material selection, forming, heat treatment, machining, dimensional inspection, surface finishing, cleaning, and final quality review. Composition and impurity control may be supported by analytical methods such as ICP, GDMS, carbon/sulfur analysis, oxygen/nitrogen analysis, and metallographic inspection where appropriate.

Clean Handling and Packaging
Targets are prepared for deposition use with clean surface handling and protective packaging. Store sealed in a dry environment, handle with clean gloves, and avoid direct contact with oil, dust, moisture, or other surface contamination before installation.

Technical Specifications

Material: Nickel Chromium Alloy (NiCr)
Purity / Composition: 99.9% Purity, Ni:Cr = 80:20
Form: Circular sputtering target
Available Diameters: 1.97 inch diameter (50 mm), 2 inch diameter (50.8 mm), 2.36 inch diameter (60 mm), 3 inch diameter (76.2 mm), 3.15 inch diameter (80 mm), 4 inch diameter (101.6 mm), 3.94 inch diameter (100 mm)
Available Thickness / Backing Options: 3 mm thick
Equipment: Single-target sputtering systems, multi-target sputtering systems, ion sputtering systems, and magnetron sputtering equipment
Packaging: Protective target packaging for laboratory shipment and storage

Common Applications

– resistive thin-film deposition; heater and resistor film research; NiCr alloy coating development; PVD process evaluation
– Academic, industrial, and pilot-scale thin-film process development