Showing 385–400 of 476 results
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$196.29 – $309.06Price range: $196.29 through $309.06
Titanium Diboride (TiB₂) Evaporation Pellets, 99.5% Purity Nanostore Titanium Diboride (TiB₂) evaporation pellets are high-purity compound source materials supplied for evaporation coating, thin-film deposition research, optical and functional films, and laboratory PVD process development. The pellet format is used for weighing, source loading, and small-batch experimental workflows where clean handling and controlled material identity are…
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$392.59 – $680.78Price range: $392.59 through $680.78
Titanium Diboride (TiB₂) Sputtering Target, 99.9% Purity, Circular Nanostore’s Titanium Diboride (TiB₂) sputtering target is a 99.9% purity boride ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work. Key Features Source Material Supplied as 99.9% Purity for…
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$186.54 – $242.23Price range: $186.54 through $242.23
Titanium Dioxide (TiO₂) Evaporation Pellets, 99.99% Purity Nanostore Titanium Dioxide (TiO₂) evaporation pellets are compound source materials supplied for evaporation coating, thin-film deposition research, optical and functional films, and laboratory PVD process development. The pellet format is convenient for weighing, source loading, and small-batch experimental workflows where clean handling and controlled material identity are important….
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$274.25 – $559.66Price range: $274.25 through $559.66
Titanium Dioxide (TiO₂) Sputtering Target, 99.99% Purity, Circular Nanostore’s Titanium Dioxide (TiO₂) sputtering target is a 99.99% purity oxide ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work. Key Features Source Material Supplied as 99.99% Purity for…
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$977.32 – $1,670.64Price range: $977.32 through $1,670.64
Titanium Disilicide (TiSi₂) Sputtering Target, 99.9% Purity, Circular Nanostore’s Titanium Disilicide (TiSi₂) sputtering target is a 99.9% purity metal silicide PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work. Key Features Source Material Supplied as 99.9% Purity for…
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Price upon request
Titanium Iron Alloy (TiFe) Pellets And Pieces, 99.9% Purity (Request Current Price) Nanostore Titanium Iron Alloy (TiFe) pellets and pieces are alloy source materials supplied for thin-film deposition research, evaporation source loading, custom alloy preparation, and laboratory materials development. The pellet and piece formats are convenient for weighing, loading, and small-batch experimental workflows where material…
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Price upon request
Titanium Molybdenum Alloy (TiMo) Pellets And Pieces, 99.9% Purity (Request Current Price) Nanostore Titanium Molybdenum Alloy (TiMo) pellets and pieces are alloy source materials supplied for thin-film deposition research, evaporation source loading, custom alloy preparation, and laboratory materials development. The pellet and piece formats are convenient for weighing, loading, and small-batch experimental workflows where material…
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$977.32 – $1,634.45Price range: $977.32 through $1,634.45
Titanium Monoxide (TiO) Sputtering Target, 99.9% Purity, Circular ZHC LAB’s Titanium Monoxide (TiO) sputtering target is a 99.9% purity titanium monoxide ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency, and specified…
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$203.25 – $381.45Price range: $203.25 through $381.45
Titanium Nitride (TiN) Evaporation Pellets, 99.9% Purity Nanostore Titanium Nitride (TiN) evaporation pellets are compound source materials supplied for evaporation coating, thin-film deposition research, optical and functional films, and laboratory PVD process development. The pellet format is convenient for weighing, source loading, and small-batch experimental workflows where clean handling and controlled material identity are important….
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$357.79 – $1,144.39Price range: $357.79 through $1,144.39
Titanium Nitride (TiN) Sputtering Target, 99.9% Purity, Circular ZHC LAB’s Titanium Nitride (TiN) sputtering target is a 99.9% purity nitride ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency, and specified material…
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$804.69 – $1,456.24Price range: $804.69 through $1,456.24
Titanium Pentoxide (Ti₃O₅) Sputtering Target, 99.99% Purity, Circular Nanostore’s Titanium Pentoxide (Ti₃O₅) sputtering target is a 99.99% purity titanium oxide ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work. Key Features Source Material Supplied as 99.99% Purity…
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$1,098.44 – $1,216.78Price range: $1,098.44 through $1,216.78
Titanium Silicon Alloy (TiSi) Sputtering Target, 99.9% Purity, Ti:Si = 1:1 at%, Circular ZHC LAB’s Titanium Silicon Alloy (TiSi) sputtering target is a 99.9% purity, ti:si = 1:1 at% binary alloy and silicide research PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research,…
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Price upon request
Titanium Silicon Molybdenum Alloy (TiSiMo) Sputtering Target, 99.9% Purity, Ti:Si:Mo = 1:1:2 at%, Circular (Price Upon Request) ZHC LAB’s Titanium Silicon Molybdenum Alloy (TiSiMo) sputtering target is a 99.9% purity, ti:si:mo = 1:1:2 at% ternary alloy PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats…
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Price upon request
Titanium Silicon Tantalum Alloy (TiSiTa) Sputtering Target, 99.9% Purity, Ti:Si:Ta = 1:1:1 at%, Circular (Price Upon Request) ZHC LAB’s Titanium Silicon Tantalum Alloy (TiSiTa) sputtering target is a 99.9% purity, ti:si:ta = 1:1:1 at% ternary alloy PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats…
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$1,073.38 – $1,979.72Price range: $1,073.38 through $1,979.72
Titanium Telluride (TiTe₂) Sputtering Target, 99.9% Purity, Circular Nanostore’s Titanium Telluride (TiTe₂) sputtering target is a 99.9% purity transition-metal chalcogenide ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work. Key Features Source Material Supplied as 99.9% Purity…
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Price upon request
Titanium Zirconium Hafnium Niobium Tantalum Alloy (TiZrHfNbTa) Ingots, 99.9% Purity (Request Current Price) Nanostore Titanium Zirconium Hafnium Niobium Tantalum Alloy (TiZrHfNbTa) ingots are alloy source materials supplied for thin-film deposition research, evaporation source loading, custom alloy preparation, and laboratory materials development. The pellet and piece formats are convenient for weighing, loading, and small-batch experimental workflows…
