Showing 337–352 of 476 results

  • Strontium Manganate (SrMnO3) Sputtering Target, 99.9% Purity, Circular

    Strontium Manganate (SrMnO₃) Sputtering Target, 99.9% Purity, Circular

    Price range: $1,098.44 through $1,574.58

    Strontium Manganate (SrMnO₃) Sputtering Target, 99.9% Purity, Circular Nanostore’s Strontium Manganate (SrMnO₃) sputtering target is a 99.9% purity perovskite manganite oxide PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work. Key Features Source Material Supplied as 99.9% Purity…

    Select optionsLoading Done This product has multiple variants. The options may be chosen on the product page
  • Strontium Molybdate (SrMoO4) Sputtering Target, 99.9% Purity, Circular (Price Upon Request)

    Strontium Molybdate (SrMoO₄) Sputtering Target, 99.9% Purity, Circular (Price Upon Request)

    Price upon request

    Strontium Molybdate (SrMoO₄) Sputtering Target, 99.9% Purity, Circular (Price Upon Request) Nanostore’s Strontium Molybdate (SrMoO₄) sputtering target is a 99.9% purity molybdate oxide ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work. Pricing is provided upon request…

  • Strontium Niobate (SrNbO3) Sputtering Target, 99.9% Purity, Circular

    Strontium Niobate (SrNbO₃) Sputtering Target, 99.9% Purity, Circular

    Price range: $1,122.11 through $1,503.58

    Strontium Niobate (SrNbO₃) Sputtering Target, 99.9% Purity, Circular Nanostore’s Strontium Niobate (SrNbO₃) sputtering target is a 99.9% purity conductive perovskite oxide PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work. Key Features Source Material Supplied as 99.9% Purity…

    Select optionsLoading Done This product has multiple variants. The options may be chosen on the product page
  • Strontium Ruthenate (SrRuO3) Sputtering Target, 99.99% Purity, Circular

    Strontium Ruthenate (SrRuO₃) Sputtering Target, 99.99% Purity, Circular

    Price range: $2,576.98 through $5,108.02

    Strontium Ruthenate (SrRuO₃) Sputtering Target, 99.99% Purity, Circular Nanostore’s Strontium Ruthenate (SrRuO₃) sputtering target is a 99.99% purity conductive perovskite oxide PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work. Key Features Source Material Supplied as 99.99% Purity…

    Select optionsLoading Done This product has multiple variants. The options may be chosen on the product page
  • Strontium Stannate (SrSnO3) Sputtering Target, 99.9% Purity, Circular (Price Upon Request)

    Strontium Stannate (SrSnO₃) Sputtering Target, 99.9% Purity, Circular (Price Upon Request)

    Price upon request

    Strontium Stannate (SrSnO₃) Sputtering Target, 99.9% Purity, Circular (Price Upon Request) Nanostore’s Strontium Stannate (SrSnO₃) sputtering target is a 99.9% purity perovskite stannate oxide PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work. Pricing is provided upon request…

  • Strontium Titanate (SrTiO3) Evaporation Pellets, 99.95% Purity

    Strontium Titanate (SrTiO₃) Evaporation Pellets, 99.95% Purity

    Price range: $215.78 through $366.14

    Strontium Titanate (SrTiO₃) Evaporation Pellets, 99.95% Purity Nanostore Strontium Titanate (SrTiO₃) evaporation pellets are compound source materials supplied for evaporation coating, thin-film deposition research, optical and functional films, and laboratory PVD process development. The pellet format is convenient for weighing, source loading, and small-batch experimental workflows where clean handling and controlled material identity are important….

    Select optionsLoading Done This product has multiple variants. The options may be chosen on the product page
  • Strontium Titanate (SrTiO3) Sputtering Target, 99.99% Purity, Circular

    Strontium Titanate (SrTiO₃) Sputtering Target, 99.99% Purity, Circular

    Price range: $559.66 through $1,240.45

    Strontium Titanate (SrTiO₃) Sputtering Target, 99.99% Purity, Circular Nanostore’s Strontium Titanate (SrTiO₃) sputtering target is a 99.99% purity perovskite titanate oxide PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work. Key Features Source Material Supplied as 99.99% Purity…

    Select optionsLoading Done This product has multiple variants. The options may be chosen on the product page
  • Strontium Vanadate (SrVO3) Sputtering Target, 99.9% Purity, Circular (Price Upon Request)

    Strontium Vanadate (SrVO₃) Sputtering Target, 99.9% Purity, Circular (Price Upon Request)

    Price upon request

    Strontium Vanadate (SrVO₃) Sputtering Target, 99.9% Purity, Circular (Price Upon Request) Nanostore’s Strontium Vanadate (SrVO₃) sputtering target is a 99.9% purity conductive perovskite oxide PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work. Pricing is provided upon request…

  • Tantalum (Ta) Evaporation Boat, High-Purity

    Tantalum (Ta) Evaporation Boat, High-Purity (Request Current Price)

    Price upon request

    Tantalum (Ta) Evaporation Boat, (Request Current Price) Tantalum (Ta) evaporation boat is a deposition accessory supplied for thin-film laboratories, vacuum coating systems, thermal evaporation setups, and PVD research workflows. It is intended for clean source loading, fixture replacement, and controlled materials handling for deposition work. Pricing requires a current quote because accessory cost depends on…

  • Tantalum (Ta) Pellets And Pieces, 99.95%-99.99% Purity

    Tantalum (Ta) Pellets And Pieces, 99.95%-99.99% Purity (Request Current Price)

    Price upon request

    Tantalum (Ta) Pellets And Pieces, 99.95%-99.99% Purity (Request Current Price) Nanostore Tantalum (Ta) pellets and pieces are high-purity source materials supplied for thin-film deposition research, evaporation source loading, alloy preparation, and laboratory materials development. The pellet and piece formats are used for weighing, loading, and small-batch experimental workflows where material identity, purity selection, and clean…

  • Tantalum (Ta) Sputtering Target, 99.95%-99.99% Purity, Circular

    Tantalum (Ta) Sputtering Target, 99.95%-99.99% Purity, Circular

    Price range: $146.17 through $4,051.33

    Tantalum (Ta) Sputtering Target, 99.95%-99.99% Purity, Circular (Price Upon Request) Nanostore’s Tantalum (Ta) sputtering target is a 99.95%-99.99% purity refractory metal PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency, and consistent material…

    Select optionsLoading Done This product has multiple variants. The options may be chosen on the product page
  • Tantalum (Ta) Wire, 99.95% Purity

    Tantalum (Ta) Wire, 99.95% Purity (Request Current Price)

    Price upon request

    Tantalum (Ta) Wire, 99.95% Purity (Request Current Price) Tantalum (Ta) wire is a thin-film and materials-research source format supplied for PVD source loading, evaporation-related workflows, filament or wire studies, alloy preparation, and laboratory materials development. The wire and rod formats support cutting and weighing, fixture loading, and small-batch experimental work where material identity, purity, and…

  • Tantalum Carbide (TaC) Sputtering Target, 99.9% Purity, Circular (Price Upon Request)

    Tantalum Carbide (TaC) Sputtering Target, 99.9% Purity, Circular (Price Upon Request)

    Price upon request

    Tantalum Carbide (TaC) Sputtering Target, 99.9% Purity, Circular (Price Upon Request) Nanostore’s Tantalum Carbide (TaC) sputtering target is a 99.9% purity refractory carbide ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency,…

  • Tantalum Diboride (TaB2) Sputtering Target, 99.9% Purity, Circular (Price Upon Request)

    Tantalum Diboride (TaB₂) Sputtering Target, 99.9% Purity, Circular (Price Upon Request)

    Price upon request

    Tantalum Diboride (TaB₂) Sputtering Target, 99.9% Purity, Circular (Price Upon Request) Nanostore’s Tantalum Diboride (TaB₂) sputtering target is a 99.9% purity refractory boride ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work. Pricing is provided upon request…

  • Tantalum Iron Antimony Alloy (TaFeSb) Ingots, 99.9% Purity

    Tantalum Iron Antimony Alloy (TaFeSb) Ingots, 99.9% Purity (Request Current Price)

    Price upon request

    Tantalum Iron Antimony Alloy (TaFeSb) Ingots, 99.9% Purity (Request Current Price) Nanostore Tantalum Iron Antimony Alloy (TaFeSb) ingots are alloy source materials supplied for thin-film deposition research, evaporation source loading, custom alloy preparation, and laboratory materials development. The pellet and piece formats are convenient for weighing, loading, and small-batch experimental workflows where material identity, purity…

  • Tantalum Nitride (TaN) Sputtering Target, 99.9% Purity, Circular (Price Upon Request)

    Tantalum Nitride (TaN) Sputtering Target, 99.9% Purity, Circular (Price Upon Request)

    Price upon request

    Tantalum Nitride (TaN) Sputtering Target, 99.9% Purity, Circular (Price Upon Request) ZHC LAB’s Tantalum Nitride (TaN) sputtering target is a 99.9% purity refractory nitride ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional…