Showing 161–176 of 233 results
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zł2,921.23 – zł6,334.56Price range: zł2,921.23 through zł6,334.56
Silicon Nitride (Si₃N₄) Sputtering Target, 99.9% Purity, Circular (Price Upon Request) Nanostore’s Silicon Nitride (Si₃N₄) sputtering target is a 99.9% purity nitride ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work. Pricing is provided upon request because…
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Price upon request
Silicon Telluride (Si₂Te₃) Sputtering Target, 99.99% Purity, Circular (Price Upon Request) Nanostore’s Silicon Telluride (Si₂Te₃) sputtering target is a 99.99% purity telluride chalcogenide PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work. Pricing is provided upon request because…
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Price upon request
Silver (Ag) Sputtering Target, 99.99% Purity, SEM Consumable Format, Circular (Price Upon Request) Nanostore’s Silver (Ag) sputtering target is a 99.99% purity, sem consumable format noble-metal conductive PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean…
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zł1,833.52 – zł6,210.26Price range: zł1,833.52 through zł6,210.26
Silver (Ag) Sputtering Target, 99.99%-99.999% Purity, Circular (Price Upon Request) Nanostore’s Silver (Ag) sputtering target is a 99.99%-99.999% purity noble-metal conductive PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work. Pricing for this material is provided upon request…
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zł4,086.63
Strontium Aluminate (Sr₄Al₂O₇) Sputtering Target, 99.99% Purity, Circular Nanostore’s Strontium Aluminate (Sr₄Al₂O₇) sputtering target is a 99.99% purity strontium aluminate oxide ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work. Some configurations require a formal quote when…
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Price upon request
Strontium Cobalt Oxide (SrCoO₃) Sputtering Target, 99.99% Purity, Circular (Price Upon Request) Nanostore’s Strontium Cobalt Oxide (SrCoO₃) sputtering target is a 99.99% purity perovskite oxide ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work. Pricing is provided…
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zł4,086.63 – zł5,858.04Price range: zł4,086.63 through zł5,858.04
Strontium Manganate (SrMnO₃) Sputtering Target, 99.9% Purity, Circular Nanostore’s Strontium Manganate (SrMnO₃) sputtering target is a 99.9% purity perovskite manganite oxide PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work. Key Features Source Material Supplied as 99.9% Purity…
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Price upon request
Strontium Molybdate (SrMoO₄) Sputtering Target, 99.9% Purity, Circular (Price Upon Request) Nanostore’s Strontium Molybdate (SrMoO₄) sputtering target is a 99.9% purity molybdate oxide ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work. Pricing is provided upon request…
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zł4,174.68 – zł5,593.89Price range: zł4,174.68 through zł5,593.89
Strontium Niobate (SrNbO₃) Sputtering Target, 99.9% Purity, Circular Nanostore’s Strontium Niobate (SrNbO₃) sputtering target is a 99.9% purity conductive perovskite oxide PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work. Key Features Source Material Supplied as 99.9% Purity…
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zł9,587.34 – zł19,003.80Price range: zł9,587.34 through zł19,003.80
Strontium Ruthenate (SrRuO₃) Sputtering Target, 99.99% Purity, Circular Nanostore’s Strontium Ruthenate (SrRuO₃) sputtering target is a 99.99% purity conductive perovskite oxide PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work. Key Features Source Material Supplied as 99.99% Purity…
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Price upon request
Strontium Stannate (SrSnO₃) Sputtering Target, 99.9% Purity, Circular (Price Upon Request) Nanostore’s Strontium Stannate (SrSnO₃) sputtering target is a 99.9% purity perovskite stannate oxide PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work. Pricing is provided upon request…
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zł2,082.14 – zł4,614.95Price range: zł2,082.14 through zł4,614.95
Strontium Titanate (SrTiO₃) Sputtering Target, 99.99% Purity, Circular Nanostore’s Strontium Titanate (SrTiO₃) sputtering target is a 99.99% purity perovskite titanate oxide PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work. Key Features Source Material Supplied as 99.99% Purity…
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Price upon request
Strontium Vanadate (SrVO₃) Sputtering Target, 99.9% Purity, Circular (Price Upon Request) Nanostore’s Strontium Vanadate (SrVO₃) sputtering target is a 99.9% purity conductive perovskite oxide PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work. Pricing is provided upon request…
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zł543.80 – zł15,072.50Price range: zł543.80 through zł15,072.50
Tantalum (Ta) Sputtering Target, 99.95%-99.99% Purity, Circular (Price Upon Request) Nanostore’s Tantalum (Ta) sputtering target is a 99.95%-99.99% purity refractory metal PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency, and consistent material…
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Price upon request
Tantalum Carbide (TaC) Sputtering Target, 99.9% Purity, Circular (Price Upon Request) Nanostore’s Tantalum Carbide (TaC) sputtering target is a 99.9% purity refractory carbide ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency,…
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Price upon request
Tantalum Diboride (TaB₂) Sputtering Target, 99.9% Purity, Circular (Price Upon Request) Nanostore’s Tantalum Diboride (TaB₂) sputtering target is a 99.9% purity refractory boride ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work. Pricing is provided upon request…
