Showing 193–208 of 233 results
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₹37,243.97 – ₹64,583.60Price range: ₹37,243.97 through ₹64,583.60
Titanium Diboride (TiB₂) Sputtering Target, 99.9% Purity, Circular Nanostore’s Titanium Diboride (TiB₂) sputtering target is a 99.9% purity boride ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work. Key Features Source Material Supplied as 99.9% Purity for…
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₹26,017.55 – ₹53,093.03Price range: ₹26,017.55 through ₹53,093.03
Titanium Dioxide (TiO₂) Sputtering Target, 99.99% Purity, Circular Nanostore’s Titanium Dioxide (TiO₂) sputtering target is a 99.99% purity oxide ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work. Key Features Source Material Supplied as 99.99% Purity for…
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₹92,715.68 – ₹158,489.28Price range: ₹92,715.68 through ₹158,489.28
Titanium Disilicide (TiSi₂) Sputtering Target, 99.9% Purity, Circular Nanostore’s Titanium Disilicide (TiSi₂) sputtering target is a 99.9% purity metal silicide PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work. Key Features Source Material Supplied as 99.9% Purity for…
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₹92,715.68 – ₹155,055.32Price range: ₹92,715.68 through ₹155,055.32
Titanium Monoxide (TiO) Sputtering Target, 99.9% Purity, Circular ZHC LAB’s Titanium Monoxide (TiO) sputtering target is a 99.9% purity titanium monoxide ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency, and specified…
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₹33,942.08 – ₹108,564.74Price range: ₹33,942.08 through ₹108,564.74
Titanium Nitride (TiN) Sputtering Target, 99.9% Purity, Circular ZHC LAB’s Titanium Nitride (TiN) sputtering target is a 99.9% purity nitride ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency, and specified material…
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₹76,338.32 – ₹138,149.65Price range: ₹76,338.32 through ₹138,149.65
Titanium Pentoxide (Ti₃O₅) Sputtering Target, 99.99% Purity, Circular Nanostore’s Titanium Pentoxide (Ti₃O₅) sputtering target is a 99.99% purity titanium oxide ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work. Key Features Source Material Supplied as 99.99% Purity…
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₹104,206.25 – ₹115,432.67Price range: ₹104,206.25 through ₹115,432.67
Titanium Silicon Alloy (TiSi) Sputtering Target, 99.9% Purity, Ti:Si = 1:1 at%, Circular ZHC LAB’s Titanium Silicon Alloy (TiSi) sputtering target is a 99.9% purity, ti:si = 1:1 at% binary alloy and silicide research PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research,…
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Price upon request
Titanium Silicon Molybdenum Alloy (TiSiMo) Sputtering Target, 99.9% Purity, Ti:Si:Mo = 1:1:2 at%, Circular (Price Upon Request) ZHC LAB’s Titanium Silicon Molybdenum Alloy (TiSiMo) sputtering target is a 99.9% purity, ti:si:mo = 1:1:2 at% ternary alloy PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats…
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Price upon request
Titanium Silicon Tantalum Alloy (TiSiTa) Sputtering Target, 99.9% Purity, Ti:Si:Ta = 1:1:1 at%, Circular (Price Upon Request) ZHC LAB’s Titanium Silicon Tantalum Alloy (TiSiTa) sputtering target is a 99.9% purity, ti:si:ta = 1:1:1 at% ternary alloy PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats…
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₹101,828.89 – ₹187,810.04Price range: ₹101,828.89 through ₹187,810.04
Titanium Telluride (TiTe₂) Sputtering Target, 99.9% Purity, Circular Nanostore’s Titanium Telluride (TiTe₂) sputtering target is a 99.9% purity transition-metal chalcogenide ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work. Key Features Source Material Supplied as 99.9% Purity…
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₹64,583.60 – ₹147,791.16Price range: ₹64,583.60 through ₹147,791.16
Titanium(III) Oxide (Ti₂O₃) Sputtering Target, 99.9% Purity, Circular Nanostore’s Titanium(III) Oxide (Ti₂O₃) sputtering target is a 99.9% purity titanium oxide ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work. Key Features Source Material Supplied as 99.9% Purity…
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₹13,866.61 – ₹195,734.57Price range: ₹13,866.61 through ₹195,734.57
Tungsten (W) Sputtering Target, 99.95%-99.999% Purity, Circular (Price Upon Request) Nanostore’s Tungsten (W) sputtering target is a 99.95%-99.999% purity refractory metal PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency, and consistent material…
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Price upon request
Tungsten Carbide (WC) Sputtering Target, 99.9% Purity, Circular (Price Upon Request) Nanostore’s Tungsten Carbide (WC) sputtering target is a 99.9% purity carbide ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work. Pricing is provided upon request because…
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Price upon request
Tungsten Disilicide (WSi₂) Sputtering Target, 99.9% Purity, Circular (Price Upon Request) Nanostore’s Tungsten Disilicide (WSi₂) sputtering target is a 99.9% purity refractory metal silicide PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work. Pricing is provided upon request…
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₹123,621.35 – ₹272,470.44Price range: ₹123,621.35 through ₹272,470.44
Tungsten Disulfide (WS₂) Sputtering Target, 99.9% Purity, Circular (Price Upon Request) Nanostore’s Tungsten Disulfide (WS₂) sputtering target is a 99.9% purity transition-metal dichalcogenide ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work. Pricing is provided upon request…
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Price upon request
Tungsten Ditelluride (WTe₂) Sputtering Target, 99.9% Purity, Circular (Price Upon Request) Nanostore’s Tungsten Ditelluride (WTe₂) sputtering target is a 99.9% purity transition-metal dichalcogenide PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work. Pricing is provided upon request because…
