Showing 65–80 of 233 results
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kr.7,818.62 – kr.11,271.73Price range: kr.7,818.62 through kr.11,271.73
Gallium Telluride (Ga₂Te₃) Sputtering Target, 99.99% Purity, Circular Nanostore’s Gallium Telluride (Ga₂Te₃) sputtering target is a 99.99% purity compound semiconductor PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work. Key Features Source Material Supplied as 99.99% Purity for…
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kr.3,837.70 – kr.9,661.47Price range: kr.3,837.70 through kr.9,661.47
Gallium-Doped Zinc Oxide (GZO) Sputtering Target, Custom ZnO:Ga₂O₃ Composition, Circular Nanostore’s Gallium-Doped Zinc Oxide (GZO) sputtering target is a custom zno:ga2o3 composition transparent conductive oxide ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling,…
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Price upon request
Germanium (Ge) Sputtering Target, 99.9999% Purity, Circular (Price Upon Request) Nanostore’s Germanium (Ge) sputtering target is a 99.9999% purity semiconductor material PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency, and consistent material…
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Price upon request
Germanium Antimony Telluride (GeSbTe) Sputtering Target, 99.99% Purity, Ge:Sb:Te = 1:2:4 at%, Circular (Price Upon Request) Nanostore’s Germanium Antimony Telluride (GeSbTe) sputtering target is a 99.99% purity, ge:sb:te = 1:2:4 at% phase-change chalcogenide PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development,…
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Price upon request
Germanium Antimony Telluride (GeSbTe) Sputtering Target, 99.99% Purity, Ge:Sb:Te = 2:2:5 at%, Circular (Price Upon Request) Nanostore’s Germanium Antimony Telluride (GeSbTe) sputtering target is a 99.99% purity, ge:sb:te = 2:2:5 at% phase-change chalcogenide PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development,…
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kr.7,818.62 – kr.10,734.98Price range: kr.7,818.62 through kr.10,734.98
Germanium Dioxide (GeO₂) Sputtering Target, 99.99% Purity, Circular Nanostore’s Germanium Dioxide (GeO₂) sputtering target is a 99.99% purity oxide glass and ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work. Key Features Source Material Supplied as 99.99%…
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kr.8,587.97 – kr.13,338.23Price range: kr.8,587.97 through kr.13,338.23
Germanium Diselenide (GeSe₂) Sputtering Target, 99.99% Purity, Circular Nanostore’s Germanium Diselenide (GeSe₂) sputtering target is a 99.99% purity chalcogenide ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work. Key Features Source Material Supplied as 99.99% Purity for…
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kr.11,960.57 – kr.19,627.20Price range: kr.11,960.57 through kr.19,627.20
Germanium Disulfide (GeS₂) Sputtering Target, 99.99% Purity, Circular Nanostore’s Germanium Disulfide (GeS₂) sputtering target is a 99.99% purity chalcogenide compound PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work. Key Features Source Material Supplied as 99.99% Purity for…
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kr.9,661.47 – kr.14,724.85Price range: kr.9,661.47 through kr.14,724.85
Germanium Selenide (GeSe) Sputtering Target, 99.99% Purity, Circular Nanostore’s Germanium Selenide (GeSe) sputtering target is a 99.99% purity chalcogenide semiconductor PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work. Key Features Source Material Supplied as 99.99% Purity for…
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kr.11,960.57 – kr.20,700.70Price range: kr.11,960.57 through kr.20,700.70
Germanium Sulfide (GeS) Sputtering Target, 99.99% Purity, Circular Nanostore’s Germanium Sulfide (GeS) sputtering target is a 99.99% purity chalcogenide semiconductor PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work. Key Features Source Material Supplied as 99.99% Purity for…
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kr.7,058.22 – kr.14,465.42Price range: kr.7,058.22 through kr.14,465.42
Germanium Telluride (GeTe) Sputtering Target, 99.99% Purity, Circular ZHC LAB’s Germanium Telluride (GeTe) sputtering target is a 99.99% purity chalcogenide ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency, and specified material…
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Price upon request
Gold (Au) Sputtering Target, 99.999% (5N) Purity, Circular Nanostore’s Gold (Au) sputtering target is a high-purity noble-metal PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, stated dimensions, and material identity are specified. Key Features…
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Price upon request
Gold (Au) Sputtering Target, 99.999% (5N) Purity, Circular, SEM Coating Grade (Price Upon Request) Nanostore’s Gold (Au) sputtering target is a high-purity noble-metal PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, stated dimensions, and…
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kr.1,162.88 – kr.2,540.54Price range: kr.1,162.88 through kr.2,540.54
Graphite (C) Sputtering Target, 99.999% Purity, Circular Nanostore’s Graphite (C) sputtering target is a 99.999% purity carbon PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency, and consistent material identity are important. Key…
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Price upon request
Hafnium (Hf) Sputtering Target, 99.95% Purity, Circular (Price Upon Request) Nanostore’s Hafnium (Hf) sputtering target is a 99.95% purity refractory metal PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency, and consistent material…
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Price upon request
Hafnium Carbide (HfC) Sputtering Target, 99.5% Purity, Circular (Price Upon Request) Nanostore’s Hafnium Carbide (HfC) sputtering target is a 99.5% purity ultra-high-temperature carbide ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency,…
