Showing 129–144 of 476 results
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Price upon request
Gadolinium Oxide (Gd₂O₃) Sputtering Target, 99.99% Purity, Circular (Price Upon Request) Nanostore’s Gadolinium Oxide (Gd₂O₃) sputtering target is a 99.99% purity rare-earth oxide ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work. Pricing is provided upon request…
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Price upon request
Gallium Antimonide (GaSb) Sputtering Target, 99.99% Purity, Circular (Price Upon Request) Nanostore’s Gallium Antimonide (GaSb) sputtering target is a 99.99% purity III-V compound semiconductor PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work. Pricing is provided upon request…
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Kč30,195.87 – Kč190,529.94Price range: Kč30,195.87 through Kč190,529.94
Gallium Nitride (GaN) Evaporation Pellets, 99.99% Purity Nanostore Gallium Nitride (GaN) evaporation pellets are compound source materials supplied for evaporation coating, thin-film deposition research, optical and functional films, and laboratory PVD process development. The pellet format is convenient for weighing, source loading, and small-batch experimental workflows where clean handling and controlled material identity are important….
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Kč60,680.70 – Kč69,341.17Price range: Kč60,680.70 through Kč69,341.17
Gallium Nitride (GaN) Sputtering Target, 99.99% (4N) Purity, Circular Gallium Nitride (GaN) sputtering target is a compound semiconductor PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where controlled handling, stated dimensions, and material identity are specified. Features…
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Kč5,513.54 – Kč41,050.32Price range: Kč5,513.54 through Kč41,050.32
Gallium Oxide (Ga₂O₃) Evaporation Pellets, 99.99% Purity Nanostore Gallium Oxide (Ga₂O₃) evaporation pellets are compound source materials supplied for evaporation coating, thin-film deposition research, optical and functional films, and laboratory PVD process development. The pellet format is convenient for weighing, source loading, and small-batch experimental workflows where clean handling and controlled material identity are important….
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Kč14,116.27 – Kč34,641.57Price range: Kč14,116.27 through Kč34,641.57
Gallium Oxide (Ga₂O₃) Sputtering Target, 99.99% Purity, Circular Nanostore’s Gallium Oxide (Ga₂O₃) sputtering target is a 99.99% purity wide-bandgap oxide ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work. Key Features Source Material Supplied as 99.99% Purity…
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Price upon request
Gallium Sulfide (GaS) Sputtering Target, 99.9% Purity, Circular (Price Upon Request) ZHC LAB’s Gallium Sulfide (GaS) sputtering target is a 99.9% purity chalcogenide semiconductor ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional…
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Kč25,230.53 – Kč36,373.66Price range: Kč25,230.53 through Kč36,373.66
Gallium Telluride (Ga₂Te₃) Sputtering Target, 99.99% Purity, Circular Nanostore’s Gallium Telluride (Ga₂Te₃) sputtering target is a 99.99% purity compound semiconductor PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work. Key Features Source Material Supplied as 99.99% Purity for…
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Kč12,384.18 – Kč31,177.39Price range: Kč12,384.18 through Kč31,177.39
Gallium-Doped Zinc Oxide (GZO) Sputtering Target, Custom ZnO:Ga₂O₃ Composition, Circular Nanostore’s Gallium-Doped Zinc Oxide (GZO) sputtering target is a custom zno:ga2o3 composition transparent conductive oxide ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling,…
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Price upon request
Germanium (Ge) Granules, 99.999%-99.9999% Purity (Request Current Price) Nanostore Germanium (Ge) granules are evaporation source materials supplied for thin-film deposition research, PVD source loading, compound precursor studies, and laboratory materials development. The pellet and piece formats are convenient for weighing, loading, and small-batch experimental workflows where material identity, purity selection, and clean handling are important….
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Price upon request
Germanium (Ge) Sputtering Target, 99.9999% Purity, Circular (Price Upon Request) Nanostore’s Germanium (Ge) sputtering target is a 99.9999% purity semiconductor material PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency, and consistent material…
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Price upon request
Germanium Antimony Telluride (GeSbTe) Sputtering Target, 99.99% Purity, Ge:Sb:Te = 1:2:4 at%, Circular (Price Upon Request) Nanostore’s Germanium Antimony Telluride (GeSbTe) sputtering target is a 99.99% purity, ge:sb:te = 1:2:4 at% phase-change chalcogenide PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development,…
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Price upon request
Germanium Antimony Telluride (GeSbTe) Sputtering Target, 99.99% Purity, Ge:Sb:Te = 2:2:5 at%, Circular (Price Upon Request) Nanostore’s Germanium Antimony Telluride (GeSbTe) sputtering target is a 99.99% purity, ge:sb:te = 2:2:5 at% phase-change chalcogenide PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development,…
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Kč25,230.53 – Kč34,641.57Price range: Kč25,230.53 through Kč34,641.57
Germanium Dioxide (GeO₂) Sputtering Target, 99.99% Purity, Circular Nanostore’s Germanium Dioxide (GeO₂) sputtering target is a 99.99% purity oxide glass and ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work. Key Features Source Material Supplied as 99.99%…
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Kč27,713.20 – Kč43,042.22Price range: Kč27,713.20 through Kč43,042.22
Germanium Diselenide (GeSe₂) Sputtering Target, 99.99% Purity, Circular Nanostore’s Germanium Diselenide (GeSe₂) sputtering target is a 99.99% purity chalcogenide ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work. Key Features Source Material Supplied as 99.99% Purity for…
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Kč38,596.52 – Kč63,336.58Price range: Kč38,596.52 through Kč63,336.58
Germanium Disulfide (GeS₂) Sputtering Target, 99.99% Purity, Circular Nanostore’s Germanium Disulfide (GeS₂) sputtering target is a 99.99% purity chalcogenide compound PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work. Key Features Source Material Supplied as 99.99% Purity for…
