Showing 1–16 of 233 results
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CHF132.39 – CHF397.21Price range: CHF132.39 through CHF397.21
Aluminum (Al) Sputtering Target, 99.999% (5N) Purity, Circular (Price Upon Request) Nanostore’s Aluminum (Al) sputtering target is a metallic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, stated dimensions, and material identity are specified….
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CHF153.71 – CHF178.40Price range: CHF153.71 through CHF178.40
Aluminum (Al) Sputtering Target, 99.999% Purity, SEM Coating Grade, Circular Nanostore’s Aluminum (Al) sputtering target is a 99.999% purity, sem coating grade metal PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work. Key Features Source Material Supplied as…
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Price upon request
Aluminum Copper Alloy (AlCu) Sputtering Target, 99.999% Purity, Al:Cu = 95:5 at%, Circular (Price Upon Request) Nanostore’s Aluminum Copper Alloy (AlCu) sputtering target is a 99.999% purity, al:cu = 95:5 at% aluminum alloy PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development,…
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CHF886.43 – CHF1,661.79Price range: CHF886.43 through CHF1,661.79
Aluminum Diboride (AlB₂) Sputtering Target, 99.5% Purity, Circular Nanostore’s Aluminum Diboride (AlB₂) sputtering target is a 99.5% purity boride ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work. Key Features Source Material Supplied as 99.5% Purity for…
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CHF461.16 – CHF817.99Price range: CHF461.16 through CHF817.99
Aluminum Nitride (AlN) Sputtering Target, 99.9% Purity, Circular Nanostore’s Aluminum Nitride (AlN) sputtering target is a 99.9% purity nitride ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work. Key Features Source Material Supplied as 99.9% Purity for…
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CHF365.79 – CHF1,493.48Price range: CHF365.79 through CHF1,493.48
Aluminum Oxide (Al₂O₃) Sputtering Target, 99.99% Purity, Circular Nanostore’s Aluminum Oxide (Al₂O₃) sputtering target is a 99.99% purity oxide ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work. Key Features Source Material Supplied as 99.99% Purity for…
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CHF215.43 – CHF447.70Price range: CHF215.43 through CHF447.70
Aluminum-Doped Zinc Oxide (AZO) Sputtering Target, 99.99% Purity, ZnO:Al₂O₃ = 98:2 wt%, Circular Nanostore’s Aluminum-Doped Zinc Oxide (AZO) sputtering target is a 99.99% purity, zno:al2o3 = 98:2 wt% transparent conductive oxide ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and…
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Price upon request
Antimony (Sb) Sputtering Target, 99.99% Purity, Circular (Price Upon Request) ZHC LAB’s Antimony (Sb) sputtering target is a 99.99% purity high-purity metalloid material PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency, and…
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Price upon request
Antimony Selenide (Sb₂Se₃) Sputtering Target, 99.99% Purity, Circular (Price Upon Request) Nanostore’s Antimony Selenide (Sb₂Se₃) sputtering target is a 99.99% purity chalcogenide semiconductor ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work. Pricing is provided upon request…
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Price upon request
Antimony Telluride (Sb₂Te₃) Sputtering Target, 99.99% Purity, Circular (Price Upon Request) Nanostore’s Antimony Telluride (Sb₂Te₃) sputtering target is a 99.99% purity chalcogenide semiconductor ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work. Pricing is provided upon request…
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Price upon request
Barium Strontium Titanate (BST) Sputtering Target, 99.99% Purity, Circular (Price Upon Request) Nanostore’s Barium Strontium Titanate (BST) sputtering target is a 99.99% purity ferroelectric oxide ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work. Pricing is provided…
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Price upon request
Barium Titanate (BaTiO₃) Sputtering Target, 99.99% Purity, Circular (Price Upon Request) Nanostore’s Barium Titanate (BaTiO₃) sputtering target is a 99.99% purity ferroelectric oxide ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work. Pricing for this material is…
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CHF186.25 – CHF451.07Price range: CHF186.25 through CHF451.07
Bismuth (Bi) Sputtering Target, 99.99% Purity, Circular Nanostore’s Bismuth (Bi) sputtering target is a 99.99% purity metallic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency, and consistent material identity are important. Key…
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Price upon request
Bismuth Antimony Telluride (BiSbTe) Sputtering Target, 99.99% Purity, Circular (Price Upon Request) Nanostore’s Bismuth Antimony Telluride (BiSbTe) sputtering target is a 99.99% purity thermoelectric chalcogenide PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional…
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CHF624.99 – CHF1,009.86Price range: CHF624.99 through CHF1,009.86
Bismuth Ferrite (BiFeO₃) Sputtering Target, 99.9% Purity, Circular Nanostore’s Bismuth Ferrite (BiFeO₃) sputtering target is a 99.9% purity multiferroic oxide ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work. Key Features Source Material Supplied as 99.9% Purity…
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Price upon request
Bismuth Iron Garnet (Bi₃Fe₅O₁₂) Sputtering Target, 99.99% (4N) Purity, Circular (Price Upon Request) The Bismuth Iron Garnet (Bi₃Fe₅O₁₂) sputtering target is a magneto-optic oxide PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where controlled handling, stated dimensions,…
