Showing 113–128 of 208 results
Natural Mica Disc Substrates for AFM/SEM Microscopy Natural muscovite mica discs are crystalline circular substrates, cut for microscopy sample holders. Available as Dia. 13 × 0.38 mm discs, pack of 10. Key Specifications: – Format: Circular disc, Dia. 13 mm – Material: Natural Muscovite Mica [KAl₂(AlSi₃O₁₀)(OH)₂] – Thickness: 0.38 mm (standard TEM support disc thickness)…
Natural Mica Substrate Sheets for AFM/SEM Microscopy Natural muscovite mica sheets are crystalline substrates processed through peeling and cutting. Available as 11 × 11 mm square sheets (0.1 mm thick), pack of 10. Key Specifications: – Format: Square sheet, 11 × 11 mm – Material: Natural Muscovite Mica [KAl₂(AlSi₃O₁₀)(OH)₂] – Thickness: 0.1 mm (can be…
Product Name: Nb-doped Strontium Titanate (Nb:SrTiO₃) Conductive Single Crystal Substrates Packaging & Variant Options: – Packaging: 100-class clean bag, 1000-class clean room – Available Dimensions (Square/Rectangular): – 5 × 5 mm, 10 × 3 mm, 10 × 5 mm, 10 × 10 mm, 15 × 15 mm, 20 × 15 mm, 20 × 20 mm…
Nd:YAG (1.0 at.%) Single Crystal Wafers Main Specifications Dimensional tolerance: Dia: < +/-0.05 mm Flatness: λ/8 @633nm Surface fineness: 10/5 Flatness 30 arc sec. Verticality 5 arc min Coating film AR coating, HR Coating Reflect R<0.2%@1064, HR:R>99.5%@1064, R<5%@808nm Clear aperture >95% central area
Neodymium Aluminate (NdAlO₃) Single Crystal Substrate Product Overview: NdAlO₃ is a perovskite-type single crystal substrate material. It is a substrate for the epitaxial growth of high-temperature superconductor (HTS) thin films (such as YBCO) and magnetic manganite thin films due to its good lattice matching and chemical stability. Physical Properties: – Crystal Structure: Cubic System –…
Neodymium Gallate (NdGaO₃) Single Crystal Substrate Physical Properties: – Crystal Structure: Orthorhombic System – Lattice Constants: a=5.428 Angstrom, b=5.498 Angstrom, c=7.708 Angstrom (Angles: a(100) θ=17°20’; b(010) θ=16°52’; c(001) θ=12°04’) – Density: 7.57 g/cm³ – Melting Point: 1600 °C – Hardness: 5.9 (Mohs) – Growth Method: Czochralski (CZ) Standard Specifications: 1. Orientation – (110) miscut <0.3°…
Neodymium Gallium Garnet (NGG / Nd₃Ga₅O₁₂) Single Crystal Substrate Physical Properties: – Crystal Structure: Cubic System – Lattice Constant: a=12.505 Angstrom – Density: 6.6 g/cm³ – Melting Point: 1550 °C – Hardness: 7.2 (Mohs) – Growth Method: Czochralski (CZ) Standard Specifications: 1. Orientation – (111) miscut < 0.3° (customizable <0.1°) 2. Edge Orientation – (110)…
Nickel Sheet (Ni) – Polycrystalline Nickel Sheet is a polycrystalline metallic substrate used in electroplating, catalysis, thin film deposition, battery research, and surface science applications. Nickel exhibits high corrosion resistance, good mechanical strength, high thermal behavior, and strong magnetic properties at room temperature. Our nickel sheets are manufactured from nickel (Ni ≥ 99.99%), with consistent…
Nickel (Ni) Single Crystal Substrate Physical Properties: – Crystal Structure: Cubic System – Lattice Constant: 3.524 Angstrom – Melting Point: 1453 °C – Density: 8.902 g/cm³ – Mohs Hardness: 4 – Growth Method: Czochralski or Bridgman Standard Specifications: – Orientation Accuracy: miscut < 2.0° – Surface Roughness: Ra < 10 nm – Edge Orientation: Available
Nickel Oxide (NiO) Single Crystal Substrate Physical Properties: – Crystal Structure: Cubic System – Lattice Constant: a=4.18 Angstrom – Melting Point: 1984 °C – Density: 6.8 g/cm³ – Mohs Hardness: 5.5 (Mohs) – Color: dark pistachio-green
Nickel-Coated Silicon Substrates (Ni on Si (100)) Overview Our nickel-coated silicon substrates are precision-cut from research-grade Ni thin film wafers fabricated on Si (100) substrates using high-vacuum magnetron sputtering. Nickel films are used in alkaline electrolysis, oxygen evolution reaction (OER), hydrogen evolution reaction (HER), and electrode development due to their high catalytic activity and corrosion…
Nickel-Coated Silicon Wafers (Ni on Si (100)) Overview Our nickel-coated silicon wafers are fabricated using high-vacuum magnetron sputtering to ensure uniform thickness, strong adhesion, and consistent surface quality applicable to electrochemical and materials research. Nickel films are used in alkaline electrolysis, oxygen evolution reaction (OER), hydrogen evolution reaction (HER), and electrode development due to their…
Optical-Grade Transparent [KMg₃(AlSi₃O₁₀)F₂] Fluorophlogopite Mica Disc Physical Properties: – Formula: KMg₃(AlSi₃O₁₀)F₂ – Melting Point: 1375 °C – Long-term Operating Temperature: 1100 °C – Preparation Method: Platinum Crucible Melting Method
OFHC Copper Foil/sheets (99.99% Purity) – High Conductivity Research Grade Our Oxygen-Free High Conductivity (OFHC) Copper Foil is manufactured from high-purity copper (≥99.99%), offering high electrical conductivity, thermal performance, and consistent ductility. With extremely low oxygen content, this material ensures high reliability in demanding research, vacuum, and electronics applications. Designed for laboratory, semiconductor, battery research,…
Platinum-Coated Silicon Substrates (Pt/Ti on Si (100)) Overview Our platinum-coated silicon chips are precision-cut from research-grade Pt/Ti on Si (100) wafers and fabricated using high-vacuum magnetron sputtering to ensure uniform thickness, strong adhesion, and high surface quality. A titanium (Ti) adhesion layer is deposited between the silicon substrate and the platinum film to has high…
Platinum-Coated Silicon Wafers (Pt/Ti on Si (100)) Overview Our platinum-coated silicon substrates are fabricated using high-vacuum magnetron sputtering to ensure uniform thickness, high adhesion, and high surface quality applicable to specialized research and device fabrication. A titanium (Ti) adhesion layer is deposited between the silicon substrate and the platinum layer to has strong interfacial bonding…
No products in the cart.
To request a quote, please complete the form below. Your quotation should be received within one working day.
