Showing 129–144 of 233 results
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Price upon request
Molybdenum Disilicide (MoSi₂) Sputtering Target, 99.9% Purity, Circular (Price Upon Request) ZHC LAB’s Molybdenum Disilicide (MoSi₂) sputtering target is a 99.9% purity refractory metal silicide PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional…
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Price upon request
Molybdenum Disulfide (MoS₂) Sputtering Target, 99.99% Purity, Circular (Price Upon Request) Nanostore’s Molybdenum Disulfide (MoS₂) sputtering target is a 99.99% purity transition-metal dichalcogenide ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work. Pricing is provided upon request…
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Price upon request
Molybdenum Ditelluride (MoTe₂) Sputtering Target, 99.9% Purity, Circular (Price Upon Request) Nanostore’s Molybdenum Ditelluride (MoTe₂) sputtering target is a 99.9% purity transition-metal dichalcogenide ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work. Pricing is provided upon request…
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Price upon request
Molybdenum Rhenium Alloy (MoRe) Sputtering Target, 99.95% Purity, Circular (Price Upon Request) Nanostore’s Molybdenum Rhenium Alloy (MoRe) sputtering target is a 99.95% purity refractory binary alloy PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling,…
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Price upon request
Molybdenum Trioxide (MoO₃) Sputtering Target, 99.99% Purity, Conductive and Non-Conductive Grades, Circular (Price Upon Request) Nanostore’s Molybdenum Trioxide (MoO₃) sputtering target is a 99.99% purity, conductive and non-conductive grades oxide ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch…
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Price upon request
Neodymium Oxide (Nd₂O₃) Sputtering Target, 99.99% Purity, Circular (Price Upon Request) Nanostore’s Neodymium Oxide (Nd₂O₃) sputtering target is a 99.99% purity rare-earth oxide ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work. Pricing is provided upon request…
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د.إ886.22 – د.إ2,903.25Price range: د.إ886.22 through د.إ2,903.25
Nickel (Ni) Sputtering Target, 99.995% (4N5) Purity, Circular (Price Upon Request) Nanostore’s Nickel (Ni) Sputtering Target is a high-purity circular PVD source material designed for magnetron sputtering, ion sputtering, and related thin-film deposition systems. With 99.995% (4N5) nickel purity and multiple standard diameters and thicknesses, this target supports research, pilot-scale process development, semiconductor device fabrication,…
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Price upon request
Nickel Chromium Alloy (NiCr) Sputtering Target, 99.9% Purity, Ni:Cr = 80:20, Circular (Price Upon Request) Nanostore’s Nickel Chromium Alloy (NiCr) sputtering target is a 99.9% purity, ni:cr = 80:20 resistive alloy PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch…
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Price upon request
Nickel Iron Alloy (NiFe) Sputtering Target, 99.9%-99.95% Purity, Ni:Fe = 80:20 / 81:19, Circular (Price Upon Request) Nanostore’s Nickel Iron Alloy (NiFe) sputtering target is a 99.9%-99.95% purity, ni:fe = 80:20 / 81:19 magnetic alloy PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for…
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Price upon request
Nickel Iron Cobalt Alloy (NiFeCo) Sputtering Target, 99.9% Purity, Ni:Fe:Co = 1:1:1 at%, Circular (Price Upon Request) ZHC LAB’s Nickel Iron Cobalt Alloy (NiFeCo) sputtering target is a 99.9% purity, ni:fe:co = 1:1:1 at% ternary magnetic alloy PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target…
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د.إ2,322.59 – د.إ5,470.37Price range: د.إ2,322.59 through د.إ5,470.37
Nickel Oxide (NiO) Sputtering Target, 99.9% Purity, Circular (Price Upon Request) Nanostore’s Nickel Oxide (NiO) sputtering target is a 99.9% purity transition-metal oxide ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work. Pricing is provided upon request…
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Price upon request
Nickel Titanium Alloy (NiTi) Sputtering Target, 99.9% Purity, Circular (Price Upon Request) Nanostore’s Nickel Titanium Alloy (NiTi) sputtering target is a 99.9% purity shape-memory alloy PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work. Pricing is provided upon…
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Price upon request
Nickel Vanadium Alloy (NiV) Sputtering Target, 99.9% Purity, Circular (Price Upon Request) ZHC LAB’s Nickel Vanadium Alloy (NiV) sputtering target is a 99.9% purity binary metal alloy PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean…
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د.إ448.18 – د.إ2,867.59Price range: د.إ448.18 through د.إ2,867.59
Niobium (Nb) Sputtering Target, 99.95% Purity, Circular Nanostore’s Niobium (Nb) sputtering target is a 99.95% purity refractory metal PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work where clean handling, dimensional consistency, and consistent material identity are important….
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د.إ3,448.25 – د.إ5,409.25Price range: د.إ3,448.25 through د.إ5,409.25
Niobium Carbide (NbC) Sputtering Target, 99.5% Purity, Circular Nanostore’s Niobium Carbide (NbC) sputtering target is a 99.5% purity transition-metal carbide ceramic PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work. Key Features Source Material Supplied as 99.5% Purity…
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د.إ5,062.89 – د.إ7,334.59Price range: د.إ5,062.89 through د.إ7,334.59
Niobium Diselenide (NbSe₂) Sputtering Target, 99.9% Purity, Circular Nanostore’s Niobium Diselenide (NbSe₂) sputtering target is a 99.9% purity transition-metal dichalcogenide PVD source material for magnetron sputtering, ion sputtering, and laboratory thin-film deposition. It is supplied in circular target formats for research, development, and small-batch process work. Key Features Source Material Supplied as 99.9% Purity for…
