Description
MoS₂ FET Device
Device Structure:
Conductive Si Substrate / 300 nm SiO₂ Layer / Triangular MoS₂ or Mechanically Exfoliated Monolayer MoS₂ / Au+Cr+Au Electrodes
MoS₂ Layer Options:
Triangular MoS₂ (CVD-grown) or Mechanically Exfoliated Monolayer
Custom Layer Thickness Available — Please Contact Us
Device Description & Features:
High-Performance 2D Semiconductor: Molybdenum disulfide (MoS₂) is a layered transition metal dichalcogenide (TMD) with a layer-dependent bandgap (monolayer: direct, multilayer: indirect), making it ideal for high-performance electronics and optoelectronics.
Back-Gated FET Configuration: The SiO₂/Si back-gate structure provides efficient electrostatic control, ensuring low-power operation and high on/off current ratio.
Triangular MoS₂ vs. Exfoliated MoS₂:
CVD-Grown Triangular MoS₂: Ensures large-area uniformity for scalable device fabrication.
Mechanically Exfoliated MoS₂: Preserves intrinsic properties with minimal defects, optimizing carrier transport.
Metal Contact Engineering: Au+Cr+Au electrode structure ensures low-resistance Ohmic contacts, enhancing charge injection and carrier mobility.
Applications:
High-Performance Field-Effect Transistors (FETs):
MoS₂ FETs offer high mobility, strong gate control, and ultrathin channels, suitable for next-generation nanoelectronics.
Flexible and Low-Power Electronics:
Ideal for wearable devices, transparent electronics, and flexible transistors.
Optoelectronic & Photodetector Devices:
Monolayer MoS₂ exhibits strong photoluminescence, making it useful in photodetectors, LEDs, and photovoltaics.
Neuromorphic & Quantum Computing:
MoS₂’s tunable electronic and excitonic properties make it a potential candidate for neuromorphic computing and quantum electronics.
Additional information
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