Description
Mechanically Exfoliated WS₂ FET (Back-Gated WS₂ FET)
Device Structure:
Au Electrodes / WS₂ / 300 nm SiO₂ / Si Back-Gated FET
WS₂ Layer Options:
Monolayer
Few-layer ( ~5 layers)
Multilayer (~10 layers)
For specific thickness requirements, please contact us.
Device Description & Features:
High-Performance 2D Semiconductor: Tungsten disulfide (WS₂) is a layered transition metal dichalcogenide (TMD) with a layer-dependent bandgap (monolayer: direct, multilayer: indirect), making it ideal for high-performance electronic and optoelectronic applications.
Back-Gated FET Configuration: The SiO₂/Si back-gate structure provides effective electrostatic control over the WS₂ channel, ensuring low-power operation and high on/off ratio.
Mechanically Exfoliated Layers: Produces high-quality, intrinsic WS₂ films with minimal defects and superior carrier transport properties.
Gold Electrodes: Forms low-resistance Ohmic contacts, enhancing charge injection efficiency.
Tunable Thickness: Different layer options allow for studying thickness-dependent electronic and optical properties.
Applications:
High-Performance Field-Effect Transistors (FETs):
WS₂ FETs exhibit high electron mobility, strong gate tunability, and an ultrathin channel, enabling next-generation nanoelectronics.
Flexible and Low-Power Electronics:
Ideal for wearable devices, transparent electronics, and flexible transistors.
Optoelectronic & Photonic Devices:
Strong photoluminescence in monolayer WS₂ makes it suitable for photodetectors, LEDs, and photovoltaic applications.
Quantum Transport & Neuromorphic Computing:
WS₂’s spin-orbit coupling and exciton engineering allow for applications in quantum electronics and neuromorphic circuits.
Additional information
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